Pixel unit of perovskite image sensor and preparation method thereof
A pixel unit and perovskite technology, applied in the field of perovskite infrared pixel unit devices and their preparation, can solve the problems of poor performance of metal oxide thin film transistors, increase in absolute value of threshold voltage, and increase in sub-threshold swing. , to achieve the effect of fast production speed, good uniformity and strong absorption characteristics
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[0062] Such as image 3 As shown, it is a flowchart of a method for preparing a perovskite infrared pixel unit according to an embodiment of the present invention, and the method includes:
[0063] 201. Deposit the gate metal electrode 2 and the gate insulating layer 3 on the base substrate, and the gate insulating layer 3 completely covers the gate electrode 2; please refer to image 3 , image 3 It is a schematic diagram of the structure after depositing the gate metal electrode 2 and the gate insulating layer 3 in Embodiment 1 of the present invention, and the source-drain metal electrode 4 is in the shape of a block or interdigitated.
[0064] 202. Deposit a metal oxide semiconductor thin film 4 on the source gate insulating layer 3; please also refer to Figure 4 , Figure 4 It is a schematic structural diagram after depositing a metal oxide semiconductor thin film in Example 1 of the present invention.
[0065] 203. Deposit source-drain metal electrodes 5 on the meta...
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