Silicone-based hybrid polymer-coated aln filler
A polymer and silicone technology, which is applied in the treatment of dyed organic silicon compounds, nitrogen compounds, dyed polymer organic compounds, etc., can solve the problems of complicated treatment, reduced thermal conductivity, insufficient durability, etc., and achieve long-term stable use , little change in characteristics, and high thermal conductivity
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0097] (Preparation of liquid A-1)
[0098] As for the raw materials used, PDMS uses two-terminal silanol polydimethylsiloxane XC96-723 (number average molecular weight: Mn=680) manufactured by Momentive Co., Ltd., and TEOS oligomer uses ethyl silicate, Tama Chemical Industry Co., Ltd. Manufacture of SILICATE 40: Tetraethoxysilane linear 4-6 polymer oligomer (oligomer purity: 70% by mass, average molecular weight: 745), using tert-butanol as a diluting solvent: Wako Pure Chemical Industries Co., Ltd. / Wako special grade, using dibutyltin dilaurate as a condensation catalyst, and KS-1260 manufactured by Kyodo Pharmaceutical Co., Ltd., were synthesized on a scale of about 1 kg. The compounding quantity of each raw material is as follows.
[0099] Regarding the molar ratio, PDMS (XC96-723) is 185.6 g, TEOS oligomer (SILICATE 40) is 813.4 g, and the molar ratio of active ingredients of XC96-723 and SILICATE 40 oligomer is 1:2.8. 1.0 g of dibutyltin dilaurate was added as a conden...
Embodiment 2~4
[0109] (Preparation of A-2, 3, 4 solutions)
[0110] As for the raw materials used, PDMS uses two-terminal silanol polydimethylsiloxane XC96-723 (number average molecular weight: Mn=680) manufactured by Momentive Co., Ltd., and TEOS oligomer uses ethyl silicate, Tama Chemical Industry Co., Ltd. Manufacture of SILICATE 45: Tetraethoxysilane linear 8-10-mer oligomer (oligomer purity: 95% by mass, average molecular weight: 1282), using tert-butanol as a diluting solvent: Wako Pure Chemical Industries Co., Ltd. / Wako special grade, using dibutyltin dilaurate as a condensation catalyst, and KS-1260 manufactured by Kyodo Pharmaceutical Co., Ltd., were synthesized on a scale of about 1 kg. The compounding quantity of each raw material is as follows.
[0111] Liquid A-2: Regarding the molar ratio, PDMS (XC96-723) is 117.0g, TEOS oligomer (SILICATE 45) is 882.4g, and the molar ratio of active ingredients of XC96-723 and SILICATE 45 oligomer is 1:3.8 . 0.65 g of dibutyltin dilaurate w...
Embodiment 5
[0119] (Preparation of Solution A-5)
[0120] As for the raw materials used, PDMS uses two-terminal silanol polydimethylsiloxane DMS-S14 (number average molecular weight: Mn=1500) manufactured by Gelest Co., Ltd., and TEOS oligomer uses ethyl silicate, Tama Chemical Industry Co., Ltd. Manufacture of SILICATE 45: Tetraethoxysilane linear 8-10-mer oligomer (oligomer purity: 95% by mass, average molecular weight: 1282), using tert-butanol as a diluting solvent: Wako Pure Chemical Industries Co., Ltd. / Wako special grade, using dibutyltin dilaurate as a condensation catalyst, and KS-1260 manufactured by Kyodo Pharmaceutical Co., Ltd., were synthesized on a scale of about 1 kg. The compounding quantity of each raw material is as follows.
[0121] Regarding the molar ratio, PDMS (DMS-S14) was 226.2 g, TEOS oligomer (SILICATE 45) was 773.2 g, and the molar ratio of active ingredients of the oligomer of DMS-S14 and SILICATE 45 was 1:3.8. 0.6 g of dibutyltin dilaurate was added as a c...
PUM
Property | Measurement | Unit |
---|---|---|
particle size | aaaaa | aaaaa |
particle size | aaaaa | aaaaa |
electrical conductivity | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com