Crucible capable of increasing solar energy silicon ingot yield, and preparation method thereof
A technology of solar energy and crucible, which is applied in the field of photovoltaic solar polysilicon ingot casting, can solve the problems of increasing the impurity content of polysilicon ingots, failing to guarantee the yield of polysilicon ingots, and affecting the quality of polysilicon ingots, so as to facilitate the nucleation of silicon ingots, The effect of increasing the yield of silicon ingots and improving the quality of silicon ingots
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0030] Such as figure 1 As shown, the crucible that can improve the yield of solar silicon ingots includes a quartz crucible body 1, on the inner wall of the quartz crucible body 1, a high-purity octahydrate barium hydroxide coating 2, a high-purity melting barium hydroxide coating 2, and a high-purity melting The quartz slurry coating 3 is pasted and covered with a high-purity quartz wafer 4 on the bottom of the quartz crucible body 1, and the inner wall of the high-purity fused silica slurry coating 3 and the top surface of the high-purity quartz wafer 4 are spray-coated with release silicon nitride Coating 5.
[0031] Add high-purity barium hydroxide octahydrate coating 2 and high-purity fused silica slurry coating 3 between the inner wall of the quartz crucible body 1 and the release silicon nitride coating 5, which can better prevent impurities from entering the liquid state The effect of silicon can reduce the crack rate of silicon ingots, reduce the oxygen content in s...
Embodiment 2
[0038] Such as figure 1 As shown, the crucible that can improve the yield of solar silicon ingots includes a quartz crucible body 1, on the inner wall of the quartz crucible body 1, a high-purity octahydrate barium hydroxide coating 2, a high-purity melting barium hydroxide coating 2, and a high-purity melting The quartz slurry coating 3 is pasted and covered with a high-purity quartz wafer 4 at the bottom of the quartz crucible body 1, and the inner wall of the high-purity fused silica slurry coating 3 and the top surface of the high-purity quartz wafer 4 are spray-coated with release silicon nitride Coating 5.
[0039] Add high-purity barium hydroxide octahydrate coating 2 and high-purity fused silica slurry coating 3 between the inner wall of the quartz crucible body 1 and the release silicon nitride coating 5, which can better prevent impurities from entering the liquid state The effect of silicon can reduce the crack rate of silicon ingots, reduce the oxygen content in s...
Embodiment 3
[0046] Such as figure 1 As shown, the crucible that can improve the yield of solar silicon ingots includes a quartz crucible body 1, on the inner wall of the quartz crucible body 1, a high-purity octahydrate barium hydroxide coating 2, a high-purity melting barium hydroxide coating 2, and a high-purity melting The quartz slurry coating 3 is pasted and covered with a high-purity quartz wafer 4 at the bottom of the quartz crucible body 1, and the inner wall of the high-purity fused silica slurry coating 3 and the top surface of the high-purity quartz wafer 4 are spray-coated with release silicon nitride Coating 5.
[0047] Add high-purity barium hydroxide octahydrate coating 2 and high-purity fused silica slurry coating 3 between the inner wall of the quartz crucible body 1 and the release silicon nitride coating 5, which can better prevent impurities from entering the liquid state The effect of silicon can reduce the crack rate of silicon ingots, reduce the oxygen content in s...
PUM
Property | Measurement | Unit |
---|---|---|
Particle size | aaaaa | aaaaa |
Particle size | aaaaa | aaaaa |
Particle size | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com