Preparation device and method for nuclear track membrane

Abstract

The invention provides a preparation device and method for a nuclear track membrane. According to the preparation device and method, an original thin film with a latent track subjected to the heavy-ion irradiation is conveyed to the relative position of a spraying component by utilizing a transmission component, spraying and etching are carried out on the surface to be etched of the original thinfilm with the latent track by utilizing the spraying component, etching liquid is sprayed on the surface to be etched of the original thin film, so that the latent track is etched into pores, and therefore the nuclear track membrane is formed. The preparation device and method have the advantages that the target pore diameter is formed on the original thin film by using a spraying mode, and therefore the uniformity and the fluidity of the etching liquid are improved, the etching uniformity is effectively improved, and finally, the nuclear track membrane which is uniform in micropore distribution and uniform in pore diameter can be obtained.

Description

technical field [0001] The invention relates to the technical field of filter membrane manufacturing, in particular to a device and method for preparing a nuclear pore membrane. Background technique [0002] The nuclear pore membrane is a sieving filter membrane, which has the advantages of regular pore shape, controllable and uniform pore size. At present, nuclear pore membranes are mainly used in medical filtration membranes, anti-counterfeiting, battery separators, biological detection membranes, water filtration, air filtration and other fields. [0003] The existing nuclear pore membrane preparation process includes two processes of irradiation and etching. The traditional etching process mainly uses the immersion of the nuclear pore membrane into the etching solution, and controls the etched pore size by controlling the etching time. [0004] However, the disadvantages of the above-mentioned traditional preparation process are as follows: first, when etching by immer...

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Problems solved by technology

[0004] However, the disadvantages of the above-mentioned traditional preparation process are as follows: first, when etching by immersion, white flocs are produced due to the chemical reaction between the membrane and the etching solution, and these flocs are easy to stay on the surface of the membrane, making the final nuclei Porous film is difficult to clean

Second, the pore size of the nuclear pore membrane is small, which undoubtedly increases the technical difficulty, especially during the etching process, a large number of flocs will be formed, which will reduce the etching rate, hinder the etching, and cause insufficient convection between the inner wall of the channel and the outside world, thus Affected to continue etching

Therefore, the small pore etching of nuclear pore membranes is a big problem

Third, due to the poor uniformity and fluidity of the etching solution in the existing etching tank, the reaction between the etching solution and the membrane is insufficient, and the finally formed pore size is unevenly distributed on the nuclear pore membrane and the pore size is not uniform

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