Graphene facial mask

An ene mask and graphene technology, applied in the field of skin care products, can solve problems such as good skin compatibility, and achieve the effects of good biocompatibility, enhanced absorption, and good inhibitory effect

Inactive Publication Date: 2019-03-22
张雨彤
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] Existing masks generally contain chemical ingredients, which generally have the function of moisturizing the skin. It is difficult to achieve good compatibility with the skin and achieve long-lasting penetration. Therefore, there is still a lot of room for improvement in the mask

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] Preparation of Chitin Nonwoven Substrate:

[0030] The preparation method of the base layer comprises the following steps:

[0031] (1) Preparation of colloid: Purified chitin and an acid solution with a mass percentage concentration of 80% are prepared into a colloid solution with a mass percentage concentration (w / w) of 10%; the acid solution includes formic acid, acetic acid, and propionic acid one or more of them;

[0032] (2) Wire drawing: put the above colloidal solution and hydroxyethyl cellulose into a pressure-resistant stainless steel tank according to the weight ratio of 10:1, and then pour inert gas into the pressure-resistant stainless steel tank so that the pressure of the inert gas is 0.1 MPa, Keep it for 30-60 minutes, and then restore the normal pressure in the storage tank; draw the colloid solution through a wire drawing machine, and after drawing, contact with ethanol to deacidify and solidify into chitin silk threads;

[0033] (3) Deacidification:...

Embodiment 2

[0037] Preparation of Chitin Nonwoven Substrate:

[0038] The preparation method of the base layer comprises the following steps:

[0039] (1) Preparation of colloid: Purified chitin and an acid solution with a mass percentage concentration of 80% are prepared into a colloid solution with a mass percentage concentration (w / w) of 22%; the acid solution includes formic acid, acetic acid, and propionic acid one or more of them;

[0040] (2) Wire drawing: put the above colloidal solution and hydroxyethyl cellulose into a pressure-resistant stainless steel tank according to the weight ratio of 10:1, and then pour inert gas into the pressure-resistant stainless steel tank so that the pressure of the inert gas is 0.1 MPa, Keep it for 30-60 minutes, and then restore the normal pressure in the storage tank; draw the colloid solution through a wire drawing machine, and after drawing, contact with ethanol to deacidify and solidify into chitin silk threads;

[0041] (3) Deacidification:...

Embodiment 3

[0045] Preparation of Chitin Nonwoven Substrate:

[0046] The preparation method of the base layer comprises the following steps:

[0047] (1) Preparation of colloid: Purified chitin and an acid solution with a mass percentage concentration of 80% are prepared into a colloid solution with a mass percentage concentration (w / w) of 25%; the acid solution includes formic acid, acetic acid, and propionic acid one or more of them;

[0048] (2) Wire drawing: put the above colloidal solution and hydroxyethyl cellulose into a pressure-resistant stainless steel tank according to the weight ratio of 10:1, and then pour inert gas into the pressure-resistant stainless steel tank so that the pressure of the inert gas is 0.1 MPa, Keep it for 30-60 minutes, and then restore the normal pressure in the storage tank; draw the colloid solution through a wire drawing machine, and after drawing, contact with ethanol to deacidify and solidify into chitin silk threads;

[0049] (3) Deacidification:...

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Abstract

The invention relates to the technical field of skincare products and in particular relates to a graphene facial mask which comprises a base layer and an essential liquid, wherein the base layer is made from a chitin non-woven substrate; the essential liquid comprises the following components: a component A which accounts for 30% of the total mass of the essential liquid, and a component B which accounts for 70% of the total mass of the essential liquid; the component A comprises the following components: an aloe extract, a honeysuckle extract, a green tea extract, a pomegranate seed extract,a sea-buckthorn extract, phenoxyethanol and a thickening agent; the component B comprises the following components: graphene, polysodium glutamate, threonine, histidine, asparaginate, citrulline, sodium alginate, vitamin C and deionized water. The main components used in the graphene facial mask are good in biocompatibility and good in skin repairing effect; due to a porous structure of graphene,nutrient components can be promoted to infiltrate into skin, and absorption of the essential liquid by the skin can be improved; the base layer made from chitosan through drawbenching is good in biocompatibility and good in bacterium inhibition.

Description

(1) Technical field [0001] The invention relates to the technical field of skin care products, in particular to a graphene mask. (2) Background technology [0002] Nowadays, the world-famous Cleopatra often smears egg white on her face at night. When the egg white dries, it will form a tight film on the face. Wash it off with water in the morning, which can make the skin on the face smooth, tender, and keep healthy. The brilliance of youth. It is said that this is the origin of the modern popular mask. [0003] Concubine Yang Guifei of the Tang Dynasty in China, who "looks back, smiles, and lives a hundred times", is rumored to be glamorous and charming. In addition to her superior living conditions such as diet and daily life, she also benefited from the specially prepared facial masks she often used. Concubine Yang's facial mask is not difficult to make: use appropriate amount of pearl, white jade, and ginseng, grind it into a fine powder, mix it with high-quality lotus ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/19A61K8/9794A61K8/9789A61K8/73A61K8/02A61Q19/00
CPCA61K8/19A61K8/0212A61K8/0279A61K8/733A61K8/736A61K8/9789A61K8/9794A61K2800/524A61K2800/56A61K2800/5922A61Q19/00
Inventor 张雨彤
Owner 张雨彤
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