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Preparation method of calcium silicate hydrate nano-film

A technology of calcium silicate hydrate and nano-film, applied in the direction of nanotechnology, nanotechnology, nanotechnology for materials and surface science, etc., can solve the problems of complex structure and lack of microscopic level analysis of macroscopic properties, and achieve the preparation process Simple and versatile method

Active Publication Date: 2019-03-19
WUHAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the complex structure of C-S-H materials, there are relatively few studies on its microstructure. Over the years, the microscopic studies of C-S-H can only be limited to first-principle and molecular dynamics calculation simulations.
At present, there are few reports on the test methods for revealing the microstructure and properties of C-S-H, and the performance of macroscopic properties also lacks the support of analysis at the micro level. Therefore, the preparation of micro-scale C-S-H will play a role in promoting the research of this material.
At present, there is no relevant report on the application of magnetron sputtering method to the thin film preparation of cement-based materials.

Method used

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  • Preparation method of calcium silicate hydrate nano-film
  • Preparation method of calcium silicate hydrate nano-film

Examples

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Embodiment 1

[0029] The present embodiment utilizes magnetron sputtering method to prepare the method for hydrated calcium silicate nano film, carries out according to the following steps:

[0030] (1) the calcium silicate hydrate powder that synthetic calcium silicon ratio is 0.5;

[0031] (2) Calcining the synthesized calcium silicate hydrate powder at 150° C. for 2 hours, and cooling to room temperature;

[0032] (3) Press the calcined powder with a pressure of 100 MPa to obtain a target with a diameter of 60 mm and a thickness of 4 mm;

[0033] (4) The glass sheet is placed on the coating sample stage of the magnetron sputtering apparatus as the substrate, the target is placed in the magnetron target position, and the distance between the substrate and the target is adjusted to 2cm;

[0034] (5) Vacuum the coating chamber and control the vacuum degree to 5×10 -4 Pa;

[0035] (6) feed argon into the coating chamber, control the flow rate of the inert gas to be 10sccm, and control the...

Embodiment 2

[0040] The present embodiment utilizes magnetron sputtering method to prepare the method for hydrated calcium silicate nano film, carries out according to the following steps:

[0041] (1) the calcium silicate hydrate powder that synthetic calcium silicon ratio is 1.5;

[0042] (2) Calcining the synthesized calcium silicate hydrate powder at 175°C for 2.5h, and cooling to room temperature;

[0043] (3) Press the calcined powder with a pressure of 200 MPa to obtain a target with a diameter of 60 mm and a thickness of 5 mm;

[0044] (4) The glass sheet is placed on the coating sample stage of the magnetron sputtering apparatus as the substrate, the target is placed in the magnetron target position, and the distance between the substrate and the target is adjusted to be 4cm;

[0045] (5) Vacuum the coating chamber and control the vacuum degree to 5×10 -4 Pa;

[0046] (6) feed argon into the coating chamber, control the flow rate of the inert gas to be 20sccm, and control the c...

Embodiment 3

[0051] The present embodiment utilizes magnetron sputtering method to prepare the method for hydrated calcium silicate nano film, carries out according to the following steps:

[0052] (1) the calcium silicate hydrate powder that synthetic calcium silicon ratio is 2.0;

[0053] (2) Calcining the synthesized calcium silicate hydrate powder at 200°C for 2.5h, and cooling to room temperature;

[0054] (3) Press the calcined powder with a pressure of 150 MPa to obtain a target with a diameter of 60 mm and a thickness of 5 mm;

[0055] (4) The glass sheet is placed on the coating sample stage of the magnetron sputtering apparatus as a substrate, the target is placed in the magnetron target position, and the distance between the substrate and the target is adjusted to be 5cm;

[0056] (5) Vacuum the coating chamber and control the vacuum degree to 1.0×10 -3 Pa;

[0057] (6) feed krypton gas into the coating chamber, control the flow rate of the inert gas to be 50sccm, and control...

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Abstract

The invention discloses a preparation method of a calcium silicate hydrate nano-film, and particularly relates to a method for preparing the calcium silicate hydrate (C-S-H) nano-film through a magnetron sputtering method. The method comprises the steps that firstly, calcium silicate hydrate powder with a certain calcium-silicon ratio is calcined; secondly, the calcined powder is pressed into a target material through a steel die; thirdly, a film with a certain thickness is deposited on the substrate surface through a magnetron sputtering technology; and lastly, a film sample is put into a calcium hydroxide saturated aqueous solution to be soaked, and then the calcium silicate hydrate nano-film can be obtained. According to the preparation method of the calcium silicate hydrate nano-film,a foundation is laid for observation of the calcium silicate hydrate microtopography on the microscale and research on the aspects such as the mechanical property and the durability.

Description

technical field [0001] The invention belongs to the technical field of inorganic materials, and in particular relates to a preparation method of a calcium silicate hydrate nano film. technical background [0002] Cement is the most widely used building material in the world. In the past ten years, the annual output of cement in the world has been more than 3 billion tons, and it has become an important material supporting the development of human civilization; for a long time to come, cement will still be used as the main building material in various engineering fields. Calcium silicate hydrate (C-S-H for short) is the main hydration product of cement, accounting for 50-70% of the total product mass, is the main source of material strength, and is also the main factor affecting the durability of cement building structures, so C-S-H has an important role research value. [0003] The previous C-S-H research mainly focused on the macro or meso scale. Since the damage of cemen...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/54C23C14/06
CPCC23C14/06C23C14/35C23C14/542C23C14/3414C23C14/5846C23C14/10B82Y40/00B22F2201/12B22F2202/05B22F2302/45B82Y30/00C23C14/082H01J37/3405H01J2237/332
Inventor 汤盛文阿湖宝余文志周伟陈敬涛何真
Owner WUHAN UNIV
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