Preparation method of dual-band uncooled infrared detector based on MEMS resonator
A micro-electromechanical resonator and uncooled infrared technology, applied in the field of infrared detection, can solve the problems of limited material selection, affect the performance of uncooled infrared detectors, increase the thickness of the absorbing layer, etc., and achieve reliable infrared detection performance and high stability The effect of increasing the thickness of the absorbing layer
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[0048] In order to understand the above-mentioned purpose, features and advantages of the present invention more clearly, the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.
[0049] In the following description, many specific details are set forth in order to fully understand the present invention. However, the present invention can also be implemented in other ways different from those described here. Therefore, the protection scope of the present invention is not limited by the specific details disclosed below. EXAMPLE LIMITATIONS.
[0050] The present invention is based on the preparation method of the dual-band uncooled infrared detector based on the micro-electromechanical resonator 2 . Specific steps are as follows:
[0051] S1. Obtain silicon substrate 2-6
[0052] like figure 1 As shown, silicon substrates 2-6 are obtained; silicon substrates 2-6 are high-resistance double-throw sil...
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