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Preparation method for diamond film on surface of harmonic reducer

A harmonic reducer, diamond film technology, applied in metal material coating process, ion implantation plating, coating and other directions, can solve the problems of poor thermal stability, low friction coefficient, high brittleness, etc., to achieve low wear rate, The effect of a low coefficient of friction

Inactive Publication Date: 2019-03-12
佛山市南海区里水镇经济促进局 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, the pure diamond solid lubricant film has problems such as large internal stress, poor film / substrate bonding force, poor thermal stability, and high brittleness. People have developed a variety of methods to improve the performance of diamond solid lubricant film, such as mixing in diamond solid lubricant film Doping W, Ti, Cr, Zr, Cu, Si, F and other elements to form a multi-component multi-phase structure based on an amorphous carbon film
At present, doping diamond solid lubricating films is mainly doped with a single element, which also brings certain problems while improving the lubricating film; for example, doping tungsten can significantly improve the wear resistance of the film, but it will increase the friction coefficient of the film; Doping titanium is beneficial to obtain a lubricating film with a low coefficient of friction, but leads to increased brittleness of the film
At the same time, there is no method for preparing a diamond film on the surface of a harmonic reducer

Method used

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  • Preparation method for diamond film on surface of harmonic reducer

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] A method for preparing a diamond film on the surface of a harmonic reducer, comprising the steps of:

[0028] 1. First, use ultrasonic waves to perform acetone ultrasonic cleaning and ethanol ultrasonic cleaning on the surface of the harmonic reducer respectively. The temperature of ultrasonic cleaning is 50°C, and the ultrasonic time is 60 minutes.

[0029] 2. Then use ion bombardment to bombard the surface of the harmonic reducer, first place the harmonic reducer on the workpiece table in the vacuum chamber; the vacuum degree in the working room is pumped to 10 -3 After the Pa level, the working gas Ar was introduced, and the surface of the harmonic reducer was etched and cleaned by plasma bombardment. The ion cleaning time was 50 min and the voltage was 1000V to further remove impurities on the sample surface.

[0030] 3. Finally, argon gas is introduced into the vacuum chamber, and the physical vapor deposition method of ion beam enhanced deposition is adopted. Ar i...

Embodiment 2

[0032] A method for preparing a diamond film on the surface of a harmonic reducer, comprising the steps of:

[0033] 1. First, use ultrasonic waves to clean the surface of the harmonic reducer with acetone ultrasonic cleaning and ethanol ultrasonic cleaning respectively. The temperature of ultrasonic cleaning is 60°C, and the ultrasonic time is 40 minutes.

[0034] 2. Then use ion bombardment to bombard the surface of the harmonic reducer, first place the harmonic reducer on the workpiece table in the vacuum chamber; the vacuum degree in the working room is pumped to 10 -4 After the Pa level, the working gas Ar was introduced, and the surface of the harmonic reducer was etched and cleaned by plasma bombardment. The ion cleaning time was 40 min and the voltage was 1200V to further remove impurities on the sample surface.

[0035] 3. Finally, argon gas is introduced into the vacuum chamber, and the physical vapor deposition method of ion beam enhanced deposition is adopted. Ar i...

Embodiment 3

[0037] A method for preparing a diamond film on the surface of a harmonic reducer, comprising the steps of:

[0038] 1. First, use ultrasonic waves to perform acetone ultrasonic cleaning and ethanol ultrasonic cleaning on the surface of the harmonic reducer respectively. The temperature of ultrasonic cleaning is 60°C, and the ultrasonic time is 40 minutes.

[0039] 2. Then use ion bombardment to bombard the surface of the harmonic reducer, first place the harmonic reducer on the workpiece table in the vacuum chamber; the vacuum degree in the working room is pumped to 10 -3 After the Pa level, the working gas Ar was introduced, and the surface of the harmonic reducer was etched and cleaned by plasma bombardment. The ion cleaning time was 50 min and the voltage was 900V to further remove impurities on the sample surface.

[0040] 3. Finally, argon gas is introduced into the vacuum chamber, and the physical vapor deposition method of ion beam enhanced deposition is adopted. Ar io...

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Abstract

The invention discloses a preparation method for a diamond film on the surface of a harmonic reducer. The surface of the harmonic reducer is cleaned through ultrasonic cleaning and ion cleaning at first, then, a layer of tungsten-titanium-containing diamond solid lubrication film is formed on the surface of a moving part through a physical vapor deposition method (PVD), by mixing the element tungsten and the element titanium in the lubrication film at the same time, the two doped elements make up for deficiencies of each other and learn from each other, a high-performance lubrication film simultaneously having the low friction coefficient and wear rate is obtained on the surface of the harmonic reducer, and the great application prospect can be achieved.

Description

technical field [0001] The invention belongs to the technical field of surface modification, and more specifically relates to a method for preparing a diamond film on the surface of a harmonic reducer. Background technique [0002] Due to the ground storage and test requirements of various moving parts in space machinery, as well as the harsh working conditions during the launch phase, the particularity of the working environment and the high reliability requirements during service in orbit, the lubrication problem is more serious than that of general machinery on the ground. to be more complicated. To obtain good lubrication performance of harmonic reducer, low vapor pressure and ultra-low volatility should be considered; good lubrication and anti-vacuum cold welding performance; wide temperature range; can take into account the requirements of ground storage and test assessment; anti-atomic oxygen corrosion ; and high reliability and long life requirements. [0003] Diam...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/02C23C14/06C23C14/22C23C14/34
CPCC23C14/022C23C14/0611C23C14/221C23C14/34
Inventor 曾晖林顺蛟李瑞李金辉
Owner 佛山市南海区里水镇经济促进局
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