Method for improving visible light transmittance of vanadium dioxide film by using dilute sulfuric acid etching

A technology of vanadium dioxide and dilute sulfuric acid, applied in ion implantation plating, metal material coating process, coating and other directions, can solve the problem of visible light transmittance not meeting building requirements, etc., to improve visible light transmittance, improve Porosity, easy-to-control effects

Inactive Publication Date: 2019-03-01
TIANJIN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] In order to solve the problems in the prior art, the present invention provides a method for improving the visible light transmittance of the vanadium dioxide film by etching with dilute sulfuric acid, so as to solve the problem of visible light when the traditional vanadium dioxide planar film is applied to the smart window in the prior art. The problem that the transmittance does not meet the architectural requirements

Method used

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  • Method for improving visible light transmittance of vanadium dioxide film by using dilute sulfuric acid etching
  • Method for improving visible light transmittance of vanadium dioxide film by using dilute sulfuric acid etching

Examples

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Embodiment 1

[0025] (1) Cleaning of sapphire substrate:

[0026] Put the sapphire sheet into deionized water, acetone and absolute ethanol in sequence for ultrasonic cleaning, each cleaning time is 20 minutes, to remove the inorganic and organic impurities on the surface; then wash it with deionized water, and finally clean the sapphire substrate Put into absolute ethanol for later use.

[0027] (2) Preparation of metal vanadium thin film:

[0028] The cleaned sapphire substrate is placed in the vacuum chamber of the DPS-Ⅲ ultra-high vacuum target magnetron sputtering coating machine, and the metal vanadium with a mass purity of 99.99% is used as the target material, and the argon gas with a mass purity of 99.999% is used as the target material. Working gas, background vacuum 8.0×10 -4 Pa, the argon gas flow rate is 48mL / min, the sputtering working pressure is 2Pa, the sputtering power is 120W, and the sputtering time is 8min. Repeat this step to prepare 2 samples.

[0029] (3) Preparat...

Embodiment 2

[0034] (1) Cleaning of sapphire substrate:

[0035] Put the sapphire sheet into deionized water, acetone and absolute ethanol in sequence for ultrasonic cleaning, each cleaning time is 20 minutes, to remove the inorganic and organic impurities on the surface; then wash it with deionized water, and finally clean the sapphire substrate Put into absolute ethanol for later use.

[0036] (2) Preparation of metal vanadium thin film:

[0037] The cleaned sapphire substrate is placed in the vacuum chamber of the DPS-Ⅲ ultra-high vacuum target magnetron sputtering coating machine, and the metal vanadium with a mass purity of 99.99% is used as the target material, and the argon gas with a mass purity of 99.999% is used as the target material. Working gas, background vacuum 8.0×10 -4 Pa, the argon gas flow rate is 48mL / min, the sputtering working pressure is 2Pa, the sputtering power is 120W, and the sputtering time is 8min. Repeat this step to prepare 2 samples.

[0038] (3) Preparat...

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Abstract

The invention discloses a method for improving visible light transmittance of a vanadium dioxide film by using dilute sulfuric acid etching. A vanadium dioxide film, prepared through combining magnetron sputtering and rapid annealing, is etched by adopting a dilute sulfuric acid treatment mode, and the continuous planar vanadium dioxide film is etched into separate particles in an acid treatment manner in a whole preparation process, so that the porosity of the film is improved. According to the method disclosed by the invention, required process conditions are low and are easily controlled, and the visible light transmittance of VO2 can be effectively improved. A vanadium metal film is sputtered firstly, then, thermal annealing oxidation is carried out, and finally, soaking etching is carried out by using dilute sulfuric acid, so that the manufacturing cost is low, and the method is applicable to large-batch industrial production.

Description

technical field [0001] The invention relates to a method for improving the visible light transmittance of a physically sputtered planar vanadium dioxide thin film by etching with dilute sulfuric acid. Background technique [0002] Energy shortage is one of the major challenges in today's world. Evidence shows that building energy consumption accounts for 30-40% of total energy consumption, and this part of consumption is mainly used to maintain the thermal comfort of buildings. Reducing this part of energy consumption will make a huge contribution to energy conservation and emission reduction. Replacing traditional windows with smart windows will be one of the effective ways to solve this problem, because windows are the main heat exchange channel between buildings and the external environment. The main types of smart windows include electrochromic, photochromic, aerochromic and thermochromic. Among them, thermochromic smart windows have the lowest energy consumption and ...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/18C23C14/02C23C14/58
CPCC23C14/021C23C14/185C23C14/35C23C14/5806C23C14/5853
Inventor 梁继然郭津榜赵一瑞
Owner TIANJIN UNIV
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