Novel DBR structure for lattice-mismatching multi-junction solar cell

A technology of solar cells and lattice mismatch, applied in the field of solar photovoltaic power generation, to achieve the effects of improving photon absorption, reducing dislocation density, and improving radiation resistance

Pending Publication Date: 2019-02-01
ZHONGSHAN DEHUA CHIP TECH CO LTD
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  • Abstract
  • Description
  • Claims
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Problems solved by technology

However, there is still a threading dislocation density that cannot be ignored in the top sub-cell. In order to meet the high requirements of the development of aerospace technology, the crystal quality and radiation resistance of the material need to be further improved.

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  • Novel DBR structure for lattice-mismatching multi-junction solar cell
  • Novel DBR structure for lattice-mismatching multi-junction solar cell

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Embodiment Construction

[0027] In order to further illustrate the content of the present invention, the present invention will be described in detail below in conjunction with specific embodiments and accompanying drawings.

[0028] like figure 1As shown, the lattice-mismatched triple-junction solar cell provided in this embodiment includes a Ge substrate 1, and the Ge substrate is a p-type Ge single wafer; A GaInP nucleation layer 2, a GaInAs buffer layer 3, a first tunnel junction 4, a lattice gradient buffer layer 5, a DBR structure 6, a GaInAs sub-cell 7, a second tunnel junction 8 and a GaInP sub-cell are sequentially arranged from bottom to top 9; wherein, the DBR structure 6 is a GaInNAs / AlGaInAs periodic structure, which is composed of two alloy materials, GaInNAs and AlGaInAs, and the refractive index of GaInNAs of the GaInNAs / AlGaInAs periodic structure is higher than that of AlGaInAs, and between GaInNAs and AlGaInAs and between GaInNAs and There is a lattice mismatch between GaInAs, the ...

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Abstract

The invention discloses a novel DBR structure for a lattice-mismatching multi-junction solar cell, and the novel DBR structure is a GaInNAs/AlGaInAs periodic structure superimposed on a lattice gradual change buffer layer, and is made of two alloy materials: GaInNAs and AlGaInAs. GaInAs subcells are stacked on the GaInNAs/AlGaInAs periodic structure, and the GaInNAs refractive index of the GaInNAs/AlGaInAs periodic structure is higher than that of AlGaInAs, and there is lattice mismatching between GaInNAs and AlGaInAs and between GaInAs and a base region material GaInAs of the GaInAs subcells,wherein the mismatching degree is not greater than 3%. The strain compensation structure facilitates the stress release and dislocation slip. The structure provided by the invention can reduce the defect density in an epitaxial layer introduced by the mismatching, improves the material quality, can improve the anti-irradiation performance of the GaInAs subcells, adds the overall short-circuit current, open circuit voltage, filling factor and other technical indexes of the cells, and improves the overall photoelectric conversion of the cells.

Description

technical field [0001] The invention relates to the technical field of solar photovoltaic power generation, in particular to a novel DBR structure applied to lattice-mismatched multi-junction solar cells. Background technique [0002] With the development of modern industrial technology, the world-wide energy crisis and environmental pollution problems have become increasingly prominent. As a clean and renewable energy, solar energy has gradually attracted the attention of various countries. From the perspective of the development history of photovoltaic power generation technology, solar cells can be roughly divided into three categories: the first generation of crystalline silicon solar cells, the second generation of thin-film solar cells and the third generation of gallium arsenide multi-junction solar cells. At present, the conversion efficiency of commercial monocrystalline silicon cells is about 16% to 20%, and that of polycrystalline silicon cells is about 14% to 16%...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/0304H01L31/054
CPCH01L31/03048H01L31/0543H01L31/0547Y02E10/52Y02E10/544
Inventor 高熙隆刘建庆刘雪珍宋欣慰刘恒昌
Owner ZHONGSHAN DEHUA CHIP TECH CO LTD
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