Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Drying device for optical polishing wafers

A technology of drying device and polishing sheet, which is applied in the direction of drying, drying machine, drying gas arrangement, etc. It can solve the problems of poor drying efficiency, affecting processing quality, scratches on the polished surface, etc., and achieves avoiding scratches, good Protective effect, good isolation effect

Inactive Publication Date: 2019-01-22
中科泰明(南京)科技有限公司
View PDF6 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the existing ovens not only have poor drying efficiency, but also tend to scratch the polished surface due to the stacking of the front and rear sheets, which greatly affects the processing quality.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Drying device for optical polishing wafers
  • Drying device for optical polishing wafers
  • Drying device for optical polishing wafers

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0023] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. All other embodiments obtained by persons of ordinary skill in the art based on the embodiments of the present invention belong to the protection scope of the present invention.

[0024] According to an embodiment of the present invention, a drying device for an optical polishing sheet is provided.

[0025] Such as Figure 1-4 As shown, a drying device for optical polishing sheets according to an embodiment of the present invention includes a drying box 1, one side of the drying box 1 is provided with a box door 2, and the other side of the drying box 1 is Several driving motors 7 are provided, a heating blower 8 is arranged on the top of the drying box 1, and an air ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a drying device for optical polishing wafers. The device comprises a drying box, a box door is arranged on one side of the drying box, a plurality of drying motors are arrangedon the other side of the drying box, a heating fan is arranged on the top of the drying box, an air guiding pipe is arranged on one side of the heating fan, the bottom of the air guiding pipe penetrates through the drying box to be connected with an air collecting tube located on the inner top of the drying box, the bottom of the air collecting tube is provided with a plurality of air outlet pipes, a plurality groups of drying tubes are arranged in the drying box, and the end, away from a rotary shaft is fixed to the inner wall of the drying box through a bearing seat. The device has the advantages that the design is reasonable, and the use is convenient; compared with a traditional oven, the drying efficiency of the device is effectively improved, the scratching caused by stacking of theoptical polishing wafers is effectively avoided, and therefore the processing quality of the optical polishing wafers is effectively ensured.

Description

technical field [0001] The invention relates to the technical field of polishing sheet processing, in particular to a drying device for optical polishing sheets. Background technique [0002] The resins used in optical polishing sheets are basically thermoplastic resins. But it cannot use the general thermoplastic resin molding processing method, but draws on the processing method of powder metallurgy cold pressing sintering molding. First, put a pre-prepared molding material of a certain weight into the molding cavity of the die, and directly apply pressure to the molding material in the molding cavity through the pressure rod, and press it into a dense cylindrical optical polishing sheet. Then they are placed in batches in an oven for heating and curing to make optically polished sheets. However, the existing ovens not only have poor drying efficiency, but also tend to scratch the polished surface due to the stacking of the front and rear sheets, which greatly affects ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): F26B11/04F26B21/00F26B25/00F26B25/12F26B25/16
CPCF26B11/04F26B21/001F26B25/00F26B25/12F26B25/16
Inventor 张旭玮
Owner 中科泰明(南京)科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products