Preparation technology of low reflection infrared cutoff filter

Abstract

The invention belongs to the technical field of a low reflection infrared cutoff filter, and specifically relates to a preparation technology of a low reflection infrared cutoff filter. The preparation technology of a low reflection infrared cutoff filter has the following steps: S1, plating the surface of a base material with a magnesium fluoride film: plating the surface of the base material with the magnesium fluoride film in an electronic beam vapor plating mode, and enabling the plated base material to wait for moulding of the magnesium fluoride film; S2, plating films by means of high and low refractive index materials: plating the base material with the plated magnesium fluoride film in the step S1, with the high and low refractive index materials successively in an electronic beamvapor plating mode; and S3, lens surface processing: polishing the lens, wherein the surface flatness of the lens is not enough in the step S2 after film plating. The preparation technology of a low reflection infrared cutoff filter adjusts the film plating technology of the infrared cutoff filter, optimizes the film structure compositions, reaches the reflectivity in the condition of reducing 0 DEG and 30 DEG at the same time, is simple in the preparation scheme, and has better prepared finished product effect.

Description

technical field [0001] The invention relates to the technical field of low-reflection infrared cut-off filters, in particular to a preparation technology of low-reflection infrared cut-off filters. Background technique [0002] The reflectivity of the visible light band is an important index to measure the optical quality of the infrared cut filter used in the mobile phone camera module. At present, the maximum reflectance of the infrared cut filter in the visible light band in the industry is generally Rmax≤0.8% (0°) and Tmax≤1.0% (30°). [0003] With the increasingly high pixel requirements of mobile phone cameras, the reflectivity of the infrared cut filter, one of the most critical optical components, can no longer meet the needs of high-end products. Therefore, we propose a low-reflection infrared cut filter Fabrication techniques of optical filters. Contents of the invention [0004] The object of the present invention is to provide a preparation technology of a lo...

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Problems solved by technology

[0004] The object of the present invention is to provide a preparation technology of a low-reflection infrared cut-off filter, to solve the problem in the above-mentioned background technology that as the requirements for the pixels of mobile phone cameras are getting higher and higher, one of the most critical optical components is infrared The reflectivity of the cut-off filter can no longer meet the needs of high-end products

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