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Preparation method of tantalum powder

A kind of technology of tantalum powder and pulverizing equipment

Inactive Publication Date: 2018-10-09
西安赛隆增材技术股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The embodiment of the present invention provides a preparation method of tantalum powder, which is used to solve the problems in the prior art that the fluidity of tantalum powder is poor and the content of interstitial elements in the powder is high, which affects the mechanical properties of additively manufactured tantalum implants.

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  • Preparation method of tantalum powder
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  • Preparation method of tantalum powder

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preparation example Construction

[0021] figure 1 A schematic flow chart of a preparation method for tantalum powder proposed in an embodiment of the present invention, as figure 1 As shown, the method mainly includes the following steps:

[0022] In step 101, the tantalum rod is prepared by electron beam melting into a first tantalum rod satisfying the first condition, the first condition includes: O≤150ppm, C≤100ppm, N≤50ppm, H≤15ppm;

[0023] Step 102, processing the first tantalum rod into a second tantalum rod with a diameter ranging from 50 mm to 60 mm and a length ranging from 300 mm to 400 mm; extending the first end of the second tantalum rod into the atomization chamber, the The second end of the second tantalum rod is connected to the electric spindle of the plasma rotating electrode pulverizing equipment;

[0024] Step 103, the second tantalum rod is formed into tantalum powder through the plasma rotating electrode powder making equipment.

[0025] In step 101, the tantalum rod is prepared into ...

Embodiment 1

[0033] Step 1, smelting the tantalum rod into a high-purity first tantalum rod by an electron beam melting process;

[0034] O=130ppm, C=90ppm, N=30ppm, H=12ppm in the first tantalum rod.

[0035] Step 2: Machining the first tantalum rod to a second tantalum rod with a diameter of 50 mm and a length of 300 mm;

[0036] Step 3. Connect the second end of the second pure tantalum rod to the electric spindle, and extend the first end into the argon-protected spray chamber, and drive the tantalum rod to rotate at high speed in the horizontal direction with the electric spindle;

[0037] Step 4: Use a high-power plasma arc with a melting current of 4000A to melt the second tantalum rod rotating at high speed. The first end surface of the second tantalum rod is melted and centrifugally dispersed and condensed to obtain tantalum powder with high sphericity.

[0038] The diameter of the first tantalum rod in step 1 is 60 mm, the length of the first end of the second tantalum rod exten...

Embodiment 2

[0041] Step 1, smelting the tantalum rod into a high-purity first tantalum rod by an electron beam melting process;

[0042] O=130ppm, C=90ppm, N=30ppm, H=12ppm in the first tantalum rod.

[0043] Step 2: Machining the first tantalum rod to a second tantalum rod with a diameter of 60 mm and a length of 400 mm;

[0044] Step 3. Connect the second end of the second pure tantalum rod to the electric spindle, and extend the first end into the argon-protected spray chamber, and drive the second tantalum rod to rotate at high speed in the horizontal direction with the electric spindle;

[0045] Step 4: Melt and rotate the second tantalum rod at a high speed with a high-power plasma arc with a melting current of 5000A. The first end surface of the second tantalum rod is melted, centrifugally dispersed, and condensed to obtain tantalum powder with high sphericity.

[0046] The diameter of the first tantalum rod in step 1 is 70 mm, the length of the first end of the second tantalum rod ...

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Abstract

The invention discloses a reparation method of tantalum powder and relates to the technical field of preparation of high-quality metal powder. The method comprises the steps: a tantalum bar is processed into a first tantalum rod meeting first conditions by electron beam melting, and the first conditions are as follows: O is at most 150ppm, C is at most 100ppm, N is at most 50ppm and H is at most 15ppm; he first tantalum rod is processed into a second tantalum rod with the diameter being 50-60mm and the length being 300-400mm; the first end of the second tantalum rod extends into an atomizing chamber, and the second end of the second tantalum rod is connected with an electric spindle of plasma rotating electrode pulverizing equipment; and the second tantalum rod forms the tantalum powder through the plasma rotating electrode pulverizing equipment.

Description

technical field [0001] The invention relates to the technical field of high-quality metal powder preparation, in particular to a method for preparing tantalum powder. Background technique [0002] Tantalum metal is a refractory metal with exceptionally excellent corrosion resistance. It is also recognized as the metal material with the best biocompatibility. High-end biological implant parts made of pure tantalum materials have long been monopolized by foreign companies. At present, the most widely used tantalum implant is the product of Zimmer Company of the United States. The tantalum implant product of the company is to firstly pyrolyze the precursor of polyurethane foam material to obtain a glassy pyrolytic carbon framework with a spongy porous structure. , then use commercial pure tantalum as raw material, use chemical vapor deposition (English: chemical vapor deoposition, CVD) method, react with chlorine gas to generate tantalum chloride, and then pass through hydrogen...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B22F9/10
CPCB22F9/10
Inventor 贺卫卫陈斌科汤慧萍向长淑邱沙孙念光凤治华郭瑜
Owner 西安赛隆增材技术股份有限公司
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