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Quartz and methods of increasing its resistance to laser damage

A technology of anti-laser and quartz, which is applied in the field of optical materials, can solve the problems that subsurface microcracks and subsurface defects cannot be completely eliminated, thermal distortion of large-diameter components, and the existence of a pit surface, etc., to achieve stress resistance, uniform heating, and good phase capacitive effect

Active Publication Date: 2021-06-08
LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

CO 2 The laser repair method has strong process operability, low pollution and high efficiency, but it cannot completely eliminate the existence of other sub-surface defects such as sub-surface micro-cracks and impurity point defects. Annealing treatment is required, and the annealing of large-diameter components may cause thermal distortion. In addition, local high temperature will cause a large amount of material to evaporate, so that there will always be a pit on the surface of the repaired fused silica

Method used

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  • Quartz and methods of increasing its resistance to laser damage
  • Quartz and methods of increasing its resistance to laser damage
  • Quartz and methods of increasing its resistance to laser damage

Examples

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Embodiment 1

[0043] This embodiment provides a method for increasing the anti-laser damage performance of quartz, comprising the following steps:

[0044] S1, pretreatment;

[0045] Fix a 50mm×50mm×5mm fused silica substrate on a polytetrafluoroethylene fixture, first use 10% Micro90 alkaline washing solution to ultrasonically clean it for 1 hour, then rinse it with ultrapure water for 1 hour, and then use acid solution washing solution to ultrasonically clean it for 1 hour. Wash for 2 hours and rinse with ultrapure water for 1 hour. Wherein, the acid liquid is a liquid obtained by mixing nitric acid and hydrogen peroxide at a volume ratio of 1.5:1.

[0046] S2, etching;

[0047] Etching with hydrofluoric acid buffer solution for 2 hours and rinsing with ultrapure water for 1 hour to obtain a fused silica substrate with an etching depth of 20 microns. Wherein, the hydrofluoric acid buffer solution is prepared by mixing hydrofluoric acid, fluoride salt and water in a volume ratio of 1:4:...

Embodiment 2

[0053] This embodiment provides a method for increasing the anti-laser damage performance of quartz, comprising the following steps:

[0054] S1, pretreatment;

[0055] Fix a 50mm×50mm×5mm fused silica substrate on a polytetrafluoroethylene fixture, first use 10% Micro90 alkaline washing solution to ultrasonically clean it for 1 hour, then rinse it with ultrapure water for 1 hour, and then use acid solution washing solution to ultrasonically clean it for 1 hour. Wash for 1 hour and rinse with ultrapure water for 1 hour. Wherein, the acid liquid is a liquid obtained by mixing nitric acid and hydrogen peroxide at a volume ratio of 2.5:1.

[0056] S2, etching;

[0057] Etching with hydrofluoric acid buffer solution for 3 hours and rinsing with ultrapure water for 1 hour to obtain a fused silica substrate with an etching depth of 30 microns. Wherein, the hydrofluoric acid buffer solution is prepared by mixing hydrofluoric acid, fluoride salt and water in a volume ratio of 1:4:1...

Embodiment 3

[0062] This embodiment provides a method for increasing the anti-laser damage performance of quartz, comprising the following steps:

[0063] S1, pretreatment;

[0064] Fix a 50mm×50mm×5mm fused silica substrate on a polytetrafluoroethylene fixture, first use 10% Micro90 alkaline washing solution to ultrasonically clean it for 1 hour, then rinse it with ultrapure water for 0.5 hour, and then use acid solution washing solution to ultrasonically clean it. Wash for 2 hours and rinse with ultrapure water for 1 hour. Wherein, the acid liquid is a liquid obtained by mixing nitric acid and hydrogen peroxide at a volume ratio of 2:1.

[0065] S2, etching;

[0066] Etching with hydrofluoric acid buffer solution for 0.5 hour and rinsing with ultrapure water for 1 hour to obtain a fused silica substrate with an etching depth of 5 microns. Wherein, the hydrofluoric acid buffer solution is prepared by mixing hydrofluoric acid, fluoride salt and water according to a volume ratio of 1:4:8...

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Abstract

The invention relates to the field of optical materials, in particular to a quartz and a method for increasing the anti-laser damage performance of the quartz. The method for increasing the anti-laser damage performance of quartz comprises the following steps: depositing silicon dioxide on the quartz substrate after etching the quartz substrate; while depositing the silicon dioxide, depositing the deposited silicon dioxide Silicon is melted. It can completely remove smaller micro-cracks by etching, and at the same time, can completely expose larger micro-cracks and passivate the crack tip, which facilitates the filling and repair of micro-cracks in the subsequent cladding process. The fluidity of fused silica is then used to repair and fill the cracks, thereby improving the mechanical properties of fused silica and ultimately improving its laser damage resistance. At the same time, the large-area uniform deposition and cladding glass coating makes the entire surface of the fused silica have a better surface shape.

Description

technical field [0001] The invention relates to the field of optical materials, in particular to a quartz and a method for increasing the anti-laser damage performance of the quartz. Background technique [0002] The damage resistance of optical components in high-throughput laser devices has always been the main factor restricting device output capability and operating cost control. Therefore, improving the anti-laser damage performance of optical components has always been a research hotspot in the development of high-throughput laser devices. Fused silica glass is widely used in high-throughput laser devices due to its excellent optical properties and radiation resistance. Many scholars have done a lot of experimental and theoretical research on improving the laser damage resistance of fused silica. The research shows that the surface damage of fused silica is the key factor restricting the damage resistance of optical components, and the surface damage is mainly caused b...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C15/00C03C17/245
CPCC03C15/00C03C17/245C03C2217/213C03C2217/78C03C2218/152C03C2218/31C03C2218/32
Inventor 李昌朋李青芝石兆华邵婷夏汉定孙来喜叶鑫吴卫东蒋晓东
Owner LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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