Preparation method of anti-abrasion diamond-like carbon coating layer
A technology of diamond coating and diamond-like film, which is applied in the direction of metal material coating process, coating, ion implantation plating, etc., to achieve large-scale production, increase deposition rate, and take into account the effect of resistivity
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[0052] The preparation method of the coating of the present application comprises the following steps: spraying wet, degreasing and degreasing treatment on the surface of the substrate;
[0053] The surface of the substrate is alternately cleaned with high and low energy by using the ion source of the anode layer, the energy of the ion source of the anode layer is 1-3000eV, and the beam current intensity is 1-500mA; the surface of the substrate with a roughness less than 0.01 micron is obtained.
[0054] With the carbon target as the cathode, the generated carbon ions pass through the first oscillating wire package, the drain wire package and the magnetic filter elbow in sequence. The magnetic filtering elbow is a T-shaped tube, and the second pulse line package, the bending line package and the defocusing line package are arranged in sequence. Deposition of the ta~C coating is then carried out on the substrate.
[0055] Deposition process: arcing current is 50-100A, gas volu...
Embodiment 1
[0061] S1: Use the anode layer ion source to clean the substrate with high energy (1500-2000V), and use the anode layer ion source to clean the substrate with low energy (100-500V);
[0062] S2: The carbon target is used as the cathode, the arcing current is 100A; the high-power pulse bias voltage is 10kV, the pulse width is 1.2ms, and the pulse frequency is 50HZ; the DC bias voltage is 300V, and the duty cycle is 80%. The deposition time is 15 minutes, and the voltage of the positive pressure plate is 30-80V.
[0063] The magnetic field parameters of each wire package are as follows: 201: current 3KA, frequency 18HZ; 203: current 5A, frequency 50Hz; 204: current 20A, frequency 80HZ; 205: 3A; 207: 10A, frequency 150HZ.
[0064] S3: an array with an etching interval of 30 microns and a line width of 200 microns.
[0065] S4: Cleaning the diamond-like carbon coating with high energy (2000-2500V) using the ion source of the anode layer.
Embodiment 2
[0067] S1: Use the anode layer ion source to clean the substrate with high energy (2000-2500V), and use the anode layer ion source to clean the substrate with high energy (100-300V);
[0068] S2: The carbon target is used as the cathode, the arcing current is 100A; the high-power pulse bias voltage is 20kV, the pulse width is 1.2ms, and the pulse frequency is 100HZ; the DC bias voltage is 300V, and the duty cycle is 30%. The deposition time is 15 minutes, and the voltage of the positive pressure plate is 30-80V.
[0069] S3: an array with an etching interval of 30 microns and a line width of 200 microns.
[0070] S4: Cleaning the diamond-like carbon coating with high energy (2000-2500V) using the ion source of the anode layer.
[0071] The magnetic field parameters of each wire package are as follows: 201: current 3KA, frequency 50HZ; 203: current 5A, frequency 50Hz; 204: current 20A, frequency 80HZ; 205: 3A; 207: 10A, frequency 200HZ.
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