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On-press developing treatment-free thermal-sensitive plate with nano-micron-structure protective layer

A protective layer and nano-micron technology, which is applied to the photographic plate-making process on the pattern surface, photosensitive materials used in optomechanical equipment, printing plates, etc., can solve the problem of reducing the number of passing paper, polluting fountain solution, and normal temperature of film formation Poor permeability and other problems, to achieve the effect of high printing force and high wear resistance

Active Publication Date: 2018-07-20
LUCKY HUAGUANG GRAPHICS +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0017] The purpose of the present invention is to solve the unresolved problem of CN104730862A: "Negative Photosensitive Composition and Thermal Plate Made from the Composition", that is, the film-forming wettability of the water-soluble protective layer. The present invention adopts a hydrophilic but water-insoluble The protective layer with a nano-micron structure solves the problems of the protective layer polluting the dampening solution and the poor permeability of the film at room temperature, improves the on-machine developing ability of the plate, greatly reduces the number of passing paper, and the plate can be directly printed on the machine and can be Obtain high printing strength and realize green environmental protection printing

Method used

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  • On-press developing treatment-free thermal-sensitive plate with nano-micron-structure protective layer
  • On-press developing treatment-free thermal-sensitive plate with nano-micron-structure protective layer
  • On-press developing treatment-free thermal-sensitive plate with nano-micron-structure protective layer

Examples

Experimental program
Comparison scheme
Effect test

Synthetic example 1

[0096] Synthesis example 1 (emulsion particle P1)

[0097] Add 300g of isopropanol, 100g of deionized water, 10g (10% by weight) of exemplary compound A1 (n is 60) in a 1000ml four-necked flask with temperature-controlled heating, mechanical stirring, condensing reflux and nitrogen protection device, and heat and stir evenly , 70g (70% by weight) St (styrene), 10g (10% by weight) AN (acrylonitrile), 10g (10% by weight) HEMA hydroxyethyl methacrylate and 0.7g AIBN (azo Diisobutyronitrile), dropwise for 1 hour, add 0.3g AIBN (azobisisobutyronitrile) after another 7.5 hours of reaction, and continue to react for another 12 hours before ending.

[0098] The solid content is 25%, the GPC molecular weight is 93600, and the particle diameter is 200nm.

Synthetic example 2

[0099] Synthesis example 2 (emulsion particle P2)

[0100] Add 357g of isopropanol, 119g of deionized water, 10g (10% by weight) of exemplary compound A2 (n is 50) in a 1000ml four-necked flask with temperature-controlled heating, mechanical stirring, reflux and nitrogen protection device, and heat and stir evenly 60g (60% by weight) St (styrene), 20g (20% by weight) AN (acrylonitrile), 10g (10% by weight) HEMA hydroxyethyl methacrylate and 0.7g AIBN (azo Diisobutyronitrile), dropwise for 1.5 hours, add 0.3g AIBN (azobisisobutyronitrile) after another 7.5 hours of reaction, and continue to react for another 12 hours before ending.

[0101] The solid content (solute / solvent) was 21%, the GPC molecular weight was 76800, and the particle diameter was 150 nm.

Synthetic example 3

[0102] Synthesis example 3 (emulsion particle P3)

[0103] Add 417g of isopropanol, 139g of deionized water, 10g (10% by weight) of exemplary compound A1 (n is 40) in a 1000ml four-necked flask with temperature-controlled heating, mechanical stirring, condensing reflux and nitrogen protection device, and heat and stir evenly , 50g (50% by weight) St (styrene), 30g (30% by weight) AN (acrylonitrile), 10g (10% by weight) HEA hydroxyethyl acrylate and 0.7g AIBN (azobisiso Butyronitrile), dropwise time 2.0 hours, add 0.3g AIBN (azobisisobutyronitrile) after reacting for 7.5 hours, continue to react after 12 hours and end.

[0104] The solid content is 18%, the GPC molecular weight is 63700, and the particle diameter is 100 nm.

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Abstract

The invention relates to an on-press developing treatment-free thermal-sensitive plate with a nano-micron-structure protective layer. The on-press developing treatment-free thermal-sensitive plate comprises an aluminum plate base support, a coating layer containing a negative image light-sensitive composition and the protective layer with a nano-micron structure, all of which are distributed frombottom to top. The aluminum plate base support is subjected to electrolytic roughening, anodic oxidation and hole sealing treatment, wherein the average roughness of center lines ranges from 0.4 micron to 0.6 micron; the negative image light-sensitive composition mainly contains discrete nano-micron particles, diurethone prepolymer, multi-functional-group monomers, a thermal polymerization initiator and an infrared absorbent; and the diameter of the discrete nano-micron particles in the protective layer with the nano-micron structure ranges from 50 nm to 150 nm. The protective layer which is hydrophilic but insoluble in water and has the nano-micron structure is adopted, the problems that a fountain solution is contaminated by the protective layer, and the normal-temperature permeability of a formed film is poor are solved, the plate on-press developing capacity is improved, the number of plate passing paper is greatly reduced, plates can be directly subjected to on-press printing, high durability is achieved, and environment-friendly printing is achieved.

Description

technical field [0001] The invention belongs to the technical field of lithographic printing, and in particular relates to an on-machine developing treatment-free thermal plate with a nano-micron structure protective layer. Background technique [0002] Lithographic printing technology has moved from traditional laser phototypesetting film copying PS plate technology to computer-to-plate technology (CTP technology for short), and CTP plate materials are gradually becoming popular. There are many types of CTP plates, and the more popular ones include silver salt diffusion CTP plates, UV-CTP plates, purple laser polymerization CTP plates, thermal CTP plates, etc. The most widely used one is thermal CTP plate. [0003] CTP plate making technology requires a "developing process", and there is an environmental problem caused by waste liquid treatment. At present, the development of a new generation of green, environmentally friendly and chemical-free CTP plates is a hot spot in...

Claims

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Application Information

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IPC IPC(8): B41N1/08B41N1/10B41N1/20G03F7/004G03F7/027
CPCB41N1/083B41N1/10B41N1/20B41N2207/02B41N2207/14G03F7/004G03F7/027
Inventor 宋小伟张涛高英新高峰马天如刘松玲张攀李喜乐
Owner LUCKY HUAGUANG GRAPHICS
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