A kind of UV light curing anti-fog resin and its preparation method and application
A light-curing and anti-fog technology, applied in the direction of coating, etc., can solve the problems of short anti-fog service life, poor substrate adhesion, resistance to scratches and friction, etc., and achieve fast curing speed, good mechanical properties, and stability good sex effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0037] Embodiment 1 A kind of UV light curing anti-fog resin 1
[0038] A kind of UV photocurable antifog resin, the molecular weight of described antifog resin is about 1800, and the structural formula of described UV photocurable antifog resin is as follows:
[0039]
[0040] The preparation method of above-mentioned UV photocuring anti-fog resin is as follows:
[0041] S1: The appropriate amount of 8.92%wt benzoyl peroxide-propylene glycol monomethyl ether solution is prepared as mixed solution 1, and the appropriate amount of 5.66%wt triphenylphosphine-propylene glycol monomethyl ether solution is mixed solution 2, and the molar ratio is methacrylic acid Glycerides: methyl methacrylate: N, N-dimethylacrylamide = 3:2:12 16.0%wt propylene glycol monomethyl ether solution The appropriate amount is mixed solution 3, 15.6%wt acrylic acid-propylene glycol monomethyl ether solution An appropriate amount is the mixed solution 4, set aside.
[0042] S2: Mix part of the mixed s...
Embodiment 2
[0044] Embodiment 2 A kind of UV light curing anti-fog resin 2
[0045] A kind of UV photocurable antifog resin, the molecular weight of described antifog resin is about 2500, and the structural formula of described UV photocurable antifog resin is as follows:
[0046]
[0047] The preparation method of above-mentioned UV photocuring anti-fog resin is as follows:
[0048]S1: The appropriate amount of 8.95%wt benzoyl peroxide-propylene glycol monomethyl ether solution is prepared as mixed solution 1, and the appropriate amount of 5.47%wt triphenylphosphine-propylene glycol monomethyl ether solution is mixed solution 2, and the molar ratio is methacrylic acid Glycerides: methyl methacrylate: N, N-dimethylacrylamide = 5:5:11 15.98%wt propylene glycol monomethyl ether solution is an appropriate amount of mixed solution 3, 16.4%wt acrylic acid-propylene glycol monomethyl ether solution An appropriate amount is the mixed solution 4, set aside.
[0049] S2: Mix part of the mixed...
Embodiment 3
[0051] Embodiment 3 A kind of UV light curing anti-fog resin 3
[0052] A kind of UV photocurable antifog resin, the molecular weight of described antifog resin is about 3000, and the structural formula of described UV photocurable antifog resin is as follows:
[0053]
[0054] The preparation method of above-mentioned UV photocuring anti-fog resin is as follows:
[0055] S1: The appropriate amount of 9.05%wt benzoyl peroxide-propylene glycol monomethyl ether solution is prepared as mixed solution 1, and the appropriate amount of 5.39%wt triphenylphosphine-propylene glycol monomethyl ether solution is mixed solution 2, and the molar ratio is methacrylic acid Glycerides: methyl methacrylate: N,N-dimethylacrylamide: = 7:2:15 15.2%wt propylene glycol monomethyl ether solution The appropriate amount is mixed solution 3, 16.4%wt acrylic acid-propylene glycol monomethyl ether The appropriate amount of the solution is the mixed solution 4, which is set aside.
[0056] S2: Mix pa...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com