Uniform light element for DMD digital photolithography system and design method thereof

Abstract

The present invention provides a uniform light element for a DMD digital photolithography system and a design method thereof, belonging to the field of digital photolithography technology. The methodcomprises more than one sub lens, each sub lens is one square with a length-width ratio of 1:2, the front surface of each sub lens is a plane, and the rear surface of each sub lens is a free curved surface. The uniform light element for the DMD digital photolithography system and the design method thereof are high in utilization rate of luminous energy, good in uniform light effect, small in sizeand convenient to integrate, can perform individual design of each sub lens, employ a mode of random arrangement of area sizes and positions, break periodicity of a traditional microlens array and greatly improve the uniform light effect of a coherent source.

Description

technical field [0001] The invention belongs to the technical field of digital lithography, and in particular relates to a uniform light element for realizing a coherent point light source. Background technique [0002] With the rapid development of the circuit board, flat panel display and digital printing industries, these industries have higher and higher requirements for the photolithography exposure technology necessary in the production process, and the photolithography exposure technology has become a factor that restricts its integration and efficiency. As a key factor, it can be said that lithography exposure technology and the development of these industries complement each other and are inseparable. Lithography exposure technology has gone through the process from proximity or contact exposure to step projection exposure and then to scanning projection exposure, but without exception, these technologies all use masks as image sources. With the continuous developm...

AI Technical Summary

Problems solved by technology

However, domestic DMD digital lithography technology is still relatively backward and develops slowly

There are two main reasons: one is that the development of DMD's high-speed driver board and the corresponding lithography data processing software is backward

Second, there is a lack of efficient uniform light components

At present, the commonly used dodging method is to use the traditional microlens array or the abdominal microlens array as the dodging element. This method has a good dodging effect and high energy utilization rate, but its structure is complex, it occupies a large volume, and it is not conducive to integration. Moreover, since the light source in the lithography system is mostly a coherent light source, and its sub-lenses are arranged periodically, there will be coherent fringes on the target surface, which will affect the uniform light effect

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