Manufacturing method of polysilicon thin film, thin film, transistor, substrate and laser equipment
A manufacturing method and technology of laser equipment, which are applied in the manufacturing of semiconductor devices, electric solid-state devices, semiconductor/solid-state devices, etc. The effect of uneven polysilicon grains
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[0029] In order to make the technical problems, technical solutions and advantages to be solved by the embodiments of the present invention clearer, the following will describe in detail with reference to the drawings and specific embodiments.
[0030] The manufacturing method of the low-temperature polysilicon film described in the specific embodiment of the present invention, such as figure 1 shown, including steps:
[0031] S110, forming a buffer layer on a substrate;
[0032] S120, forming an amorphous silicon layer on the buffer layer;
[0033] S130, performing excimer laser annealing on the amorphous silicon layer for the first time by using a laser beam of a first wavelength;
[0034] S140, performing a second excimer laser annealing on the amorphous silicon layer after the first excimer laser annealing by using a laser beam of a second wavelength, wherein the second wavelength is smaller than the first wavelength.
[0035] The manufacturing method of the low-tempera...
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