Preparation method for carbon film with vacuum long-lasting lubricating performance
A technology of lubricating performance and carbon film, which is applied in the field of carbon film preparation, can solve the problem of short wear life of carbon film, and achieve the effects of relieving internal stress, long life, excellent mechanical strength and elastic deformation ability
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Embodiment 1
[0033] Equipment: The process is done on a magnetron sputtering coater with four target positions. Two of the target assembly steps (1) processed metal Cu targets are connected to an intermediate frequency sputtering power supply (20~60KHz) for excitation; the other two targets are assembled with silicon targets and are also connected to an intermediate frequency sputtering power supply ( 20~60KHz) for excitation; the sample holder is connected to a pulse bias power supply (20~60KHz) to apply negative voltage.
[0034] Coating process: including the following process steps:
[0035] (1) Metal Cu target pretreatment
[0036] Using conventional magnetron sputtering technology, pre-deposit a layer of Cu film with a thickness of 6nm on the surface of the metal Cu target; Under heat treatment for 10 minutes, and naturally cooled, a layer of Cu nanoparticles is formed on the surface of the target.
[0037] (2) Film coating
[0038] Plasma cleaning surface: place the sample blo...
Embodiment 2
[0043] Equipment: with embodiment 1.
[0044] Coating process: including the following process steps:
[0045] (1) Metal Cu target pretreatment
[0046] Using magnetron sputtering technology, pre-deposit a layer of Cu film with a thickness of 20 nm on the surface of the metal Cu target; then, under the protection of vacuum atmosphere, use a heating furnace to heat-treat the Cu target with the pre-deposited Cu film at 800 ° C for 30 min , naturally cooled, a layer of Cu nanoparticles formed on the surface of the target.
[0047] (2) Film coating
[0048] Plasma cleaning surface: place the sample block made of 9Cr18, TC4, 20CrMnTi (surface roughness is better than 50 nm) on the sample holder in the coating chamber, and the air pressure in the vacuum chamber is pumped to 1.0×10 -3 Below Pa, feed high-purity argon until the pressure is 1.4 Pa. Turn on the bias power supply, adjust the voltage value to -800 V, and perform argon plasma bombardment cleaning for 30 min;
[004...
Embodiment 3
[0053] Equipment: with embodiment 1.
[0054] Coating process: including the following process steps:
[0055] (1) Metal Cu target pretreatment
[0056] Using magnetron sputtering technology, pre-deposit a layer of Cu film with a thickness of 45nm on the surface of the metal Cu target; then under the protection of nitrogen atmosphere, use a heating furnace to heat-treat the Cu target with the pre-deposited Cu film at 900°C for 60min, A layer of Cu nanoparticles is formed on the target surface due to natural cooling.
[0057] (2) Film coating
[0058] Plasma cleaning surface: place the sample block made of 9Cr18, TC4, 20CrMnTi (surface roughness is better than 50nm) on the sample holder in the coating chamber, and the air pressure in the vacuum chamber is pumped to 1.0×10 -3 Below Pa, feed high-purity argon until the pressure is 1.0 Pa. Turn on the bias power supply, adjust the voltage value to -600 V, and perform argon plasma bombardment cleaning for 40 min;
[0059] ...
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