Method for preparing tungsten diselenide semiconductor film on FTO substrate and application of method
A technology of tungsten diselenide and semiconductor, which is applied in the direction of photosensitive equipment, liquid chemical plating, coating, etc., can solve the problem of less film, and achieve the effect of good crystallization, uniform phase and simple preparation process
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no. 1 Embodiment
[0043] A method for preparing a tungsten diselenide semiconductor thin film on an FTO substrate, which specifically includes:
[0044] Cleaning steps for FTO conductive glass: place the FTO glass on the cleaning rack, then put it into a beaker, and use acetone, absolute ethanol, and distilled water to clean it ultrasonically for 5 minutes. After cleaning, use clean tweezers to remove the glass piece from the rack. Take it out and dry it with a lint-free cloth;
[0045]After adding 0.20g sodium borohydride into 60ml of DMF, use magnetic stirring until fully dissolved; then, after adding 8.2mmol selenium powder and 4mmol sodium tungstate in sequence, use magnetic stirring for 1 hour until fully dissolved, mix evenly to obtain the reaction precursor liquid;
[0046] Put the cleaned FTO conductive glass into a 100ml clean reactor lining, with the conductive side leaning against the inner wall of the reactor inner substrate; then slowly pour the reaction precursor solution into th...
no. 2 Embodiment
[0049] A method for preparing a tungsten diselenide semiconductor thin film on an FTO substrate, which specifically includes:
[0050] Cleaning steps for FTO conductive glass: place the FTO glass on the cleaning rack, then put it into a beaker, and use acetone, absolute ethanol, and distilled water to clean it ultrasonically for 5 minutes. After cleaning, use clean tweezers to remove the glass piece from the rack. Take it out and dry it with a lint-free cloth;
[0051] After adding 0.20g sodium borohydride into 60ml of DMF, use magnetic stirring until fully dissolved; then, after adding 8.2mmol selenium powder and 4mmol sodium tungstate in sequence, use magnetic stirring for 1 hour until fully dissolved, mix evenly to obtain the reaction precursor liquid;
[0052] Put the cleaned FTO conductive glass into a 100ml clean reactor lining, with the conductive side leaning against the inner wall of the reactor inner substrate; then slowly pour the reaction precursor solution into t...
no. 3 Embodiment
[0055] A method for preparing a tungsten diselenide semiconductor thin film on an FTO substrate, which specifically includes:
[0056] Cleaning steps for FTO conductive glass: place the FTO glass on the cleaning rack, then put it into a beaker, and use acetone, absolute ethanol, and distilled water to clean it ultrasonically for 5 minutes. After cleaning, use clean tweezers to remove the glass piece from the rack. Take it out and dry it with a lint-free cloth;
[0057] After adding 0.22g of sodium borohydride into 60ml of DMF, use magnetic stirring until it is fully dissolved; then, after adding 8.4mmol of selenium powder and 4mmol of sodium tungstate in sequence, use magnetic stirring for 1 hour until it is fully dissolved, and mix evenly to obtain a reaction precursor liquid;
[0058] Put the cleaned FTO conductive glass into a 100ml clean reactor lining, with the conductive side leaning against the inner wall of the reactor inner substrate; then slowly pour the reaction pr...
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