Breeding method and propagation method for indica-japonica intermediate type sterile line Chunjiang 35A with early flowering time and high stigma exsertion rate
A technology of exposed stigma, indica and japonica, applied in the field of breeding and propagation of the indica-japonica intermediate CMS line Chunjiang 35A, which can solve the problem of low outcross seed setting rate and seed production yield, restrictions on the popularization and application of hybrid japonica rice, and long growth period Can't wait for the problem to achieve the effect of good quality, strong stress resistance, and good outcrossing
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0019] Combined with the accompanying drawings below ( figure 1 ) further illustrate the breeding method of the present invention.
[0020] Breeding method of CMS line Chunjiang 35A:
[0021] A) Select the maintainer line Chunjiang 19B, which has the characteristics of high exposed stigma rate, early flowering time, and resistance to stripe leaf blight, and the temperature-sensitive medium-japonica maintainer line, which has the characteristics of high exposed stigma rate and early flowering time. Chunjiang 23B, crossed to get F 1 seed;
[0022] B) will F 1 After adding, to F 2 The agronomic traits, stigma exposure rate and flowering time of each individual plant in the population were screened, and the individual plants with good agronomic traits, good stress resistance, high stigma exposure rate, and early flowering time were selected. Plant F 3 The strains were screened for agronomic traits, stress resistance, stigma exposure rate and flowering time, and excellent ind...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com