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A device and method for measuring wave aberration of an optical system based on a Shack-Hartmann wavefront sensor

A technology of optical system and measuring device, which is applied in the field of optical measurement, can solve problems such as waste and inconvenience, and achieve the effect of high stability measurement

Active Publication Date: 2019-03-19
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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Problems solved by technology

[0003] The wave aberration of the optical system usually needs to be tested at the working wavelength, but in practical applications, there are many types of optical systems and the working wavelength bands are different. Therefore, it is necessary to build corresponding wave aberration measurement devices according to different working wavelengths. It is inconvenient and wasteful in practical application

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  • A device and method for measuring wave aberration of an optical system based on a Shack-Hartmann wavefront sensor
  • A device and method for measuring wave aberration of an optical system based on a Shack-Hartmann wavefront sensor
  • A device and method for measuring wave aberration of an optical system based on a Shack-Hartmann wavefront sensor

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Embodiment Construction

[0041] Exemplary embodiments of the present invention will be described in more detail below with reference to the accompanying drawings. Although exemplary embodiments of the present invention are shown in the drawings, it should be understood that the invention may be embodied in various forms and should not be limited to the embodiments set forth herein. Rather, these embodiments are provided for more thorough understanding of the present invention and to fully convey the scope of the present invention to those skilled in the art.

[0042] Such as figure 1 As shown, it is a schematic diagram of an optical system wave aberration measurement device based on a Shack-Hartmann wavefront sensor according to the present invention, including a wavelength tunable laser (1), an attenuator (2), a focusing objective lens (3), Y-type fiber coupler (4), the first five-dimensional adjustment stage (5), the first objective lens (6), the first small hole plate (7), the collimating objectiv...

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Abstract

The invention discloses a Shack-Hartmann wave-front sensor-based optical system wave aberration measurement device and method. The device includes a wavelength tunable laser, an attenuator, a focusing objective lens, a Y type optical fiber coupler, a first five-dimensional adjusting platform, a first objective lens, a first micropore plate, a collimating objective lens, a beam splitter, a first Shack-Hartmann wave-front sensor, an imaging objective lens, an optical system to be measured, a spherical reflector, a second Shack-Hartmann wave-front sensor and a data processing module. The measurement device is integrated with the first Shack-Hartmann wave-front sensor and the second Shack-Hartmann wave-front sensor, and therefore, the aberration of the optical system to be measured is only calculated from a measurement result, and the measurement of the aberration of optical systems of different working wavelengths can be realized with only such one measurement device adopted.

Description

technical field [0001] The invention relates to the technical field of optical measurement, in particular to a wave aberration measurement of an optical system based on a Shack-Hartmann wavefront sensor. Background technique [0002] The Shack-Hartmann wavefront sensor has the advantages of simple structure, fast measurement speed, strong vibration resistance, no special requirements on the linewidth, coherence and polarization state of the measurement beam, no reference light, and can record the wavefront change process in real time. At the same time, it is suitable for the advantages of continuous light and pulse light measurement. It has a wide range of applications in adaptive optics, human eye aberration detection, optical component surface shape detection, optical system wave aberration detection, etc. [0003] The wave aberration of the optical system usually needs to be tested at the working wavelength, but in practical applications, there are many types of optical ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01M11/02
CPCG01M11/02
Inventor 齐月静卢增雄齐威苏佳妮杨光华张清洋李兵王宇
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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