A kind of hosrmnzn co-doped bismuth ferrite multiferroic thin film and preparation method thereof
A technology of multiferroic thin film and bismuth ferrite, which is applied in the direction of coating, etc., to achieve the effect of precise and controllable chemical composition, low process temperature and easy realization of experimental conditions
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Embodiment 1
[0029] Step 1: Using bismuth nitrate, holmium nitrate, strontium nitrate, ferric nitrate, manganese acetate and zinc nitrate as raw materials (5% excess bismuth nitrate), the molar ratio is 0.94:0.08:0.03:0.96:0.03:0.01 (x=0.01 ) is dissolved in ethylene glycol methyl ether, stirs 30min, then adds acetic anhydride, stirs 90min, obtains the stable precursor solution that metal ion total concentration is 0.3mol / L; Wherein the volume ratio of ethylene glycol methyl ether and acetic anhydride is 3:1;
[0030]Step 2: Place the FTO / glass substrate in detergent, acetone, and ethanol in sequence for ultrasonic cleaning. After ultrasonic cleaning for 10 minutes each time, rinse the substrate with a large amount of distilled water, and finally dry it with nitrogen. Then put the FTO / glass substrate into the oven to bake until dry, take it out and let it stand at room temperature. Then place the clean substrate in an ultraviolet light irradiator for 40 minutes to make the surface of the ...
Embodiment 2
[0041] Step 1: Using bismuth nitrate, holmium nitrate, strontium nitrate, ferric nitrate, manganese acetate and zinc nitrate as raw materials (5% excess bismuth nitrate), the molar ratio is 0.94:0.08:0.03:0.95:0.03:0.02 (x=0.02 ) is dissolved in ethylene glycol methyl ether, stirs 30min, then adds acetic anhydride, stirs 90min, obtains the stable precursor solution that the total concentration of metal ions is 0.2mol / L; Wherein the volume ratio of ethylene glycol methyl ether and acetic anhydride is 2.5:1;
[0042] Step 2: Place the FTO / glass substrate in detergent, acetone, and ethanol in sequence for ultrasonic cleaning. After ultrasonic cleaning for 10 minutes each time, rinse the substrate with a large amount of distilled water, and finally dry it with nitrogen. Then put the FTO / glass substrate into the oven to bake until dry, take it out and let it stand at room temperature. Then place the clean substrate in an ultraviolet light irradiator for 40 minutes to make the surf...
Embodiment 3
[0045] Step 1: Using bismuth nitrate, holmium nitrate, strontium nitrate, iron nitrate, manganese acetate and zinc nitrate as raw materials (5% excess bismuth nitrate), the molar ratio is 0.94:0.08:0.03:0.94:0.03:0.03 (x=0.03 ) is dissolved in ethylene glycol methyl ether, stirs 30min, then adds acetic anhydride, stirs 90min, obtains the stable precursor solution that metal ion total concentration is 0.4mol / L; Wherein the volume ratio of ethylene glycol methyl ether and acetic anhydride is 3.5:1;
[0046] Step 2: Place the FTO / glass substrate in detergent, acetone, and ethanol in sequence for ultrasonic cleaning. After ultrasonic cleaning for 10 minutes each time, rinse the substrate with a large amount of distilled water, and finally dry it with nitrogen. Then put the FTO / glass substrate into the oven to bake until dry, take it out and let it stand at room temperature. Then place the clean substrate in an ultraviolet light irradiator for 40 minutes to make the surface of the...
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