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Method of manufacturing film bulk acoustic resonator on flexible substrate

A thin-film bulk acoustic wave and flexible substrate technology, which is applied in the direction of electrical components and impedance networks, can solve problems such as loss, poor hardness of flexible substrates, and device performance attenuation, so as to reduce manufacturing costs, ensure processing quality, and improve device resonance performance. Effect

Active Publication Date: 2017-05-31
SHANDONG UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] The main disadvantage of the above technical solution is that the manufactured thin film bulk acoustic resonator has one side directly contacting the flexible substrate
Due to the viscous damping characteristics of the flexible material itself to mechanical vibration, the bulk acoustic wave in the piezoelectric film will be severely lost in the flexible substrate, resulting in attenuation of device performance
In addition, for the first type of method, the hardness of the flexible substrate is poor, and the device manufacturing is directly performed on the flexible substrate, and its processing accuracy and film quality are affected.
For the second type of method, the device preparation after coating polyimide on the silicon substrate can solve the problems of processing accuracy and film quality, but the types of flexible substrates that can be used are limited
For example, dimethylsiloxane (PDMS), which is commonly used and has good biocompatibility, has a large difference in thermal expansion coefficient from the deposited material, which easily leads to excessive residual stress of the film.
The process of peeling the device from the silicon substrate is also prone to damage to some devices

Method used

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  • Method of manufacturing film bulk acoustic resonator on flexible substrate

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Embodiment Construction

[0039] The present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments, but the present invention is not limited to these embodiments.

[0040] The invention can be applied to manufacture thin film bulk acoustic wave resonators with various structures, and has no requirement on the material, structure and electrode shape of the thin film bulk acoustic wave resonator. figure 1 and figure 2 Two typical thin film bulk acoustic resonator structures manufactured by the present invention are given respectively. Such as figure 1 The thin film bulk acoustic resonator shown is a sandwich structure composed of a piezoelectric film 101 and upper electrodes 102 and lower electrodes 103 placed on both sides of the piezoelectric film 101 . Such as figure 2 The thin film bulk acoustic resonator shown is a transverse electric field excitation structure composed of a piezoelectric thin film 101 and upper electrodes 102...

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Abstract

The invention discloses a method of manufacturing a film bulk acoustic resonator on a flexible substrate. The method comprises the following steps: selecting a silicon substrate, and orderly coating a water soluble polymer film layer and a polyimide film layer on the silicon substrate; manufacturing the film bulk acoustic resonator above the polyimide film layer; manufacturing a metal post at the top face of an upper electrode of the film bulk acoustic resonator; coating a polymethyl methacrylate film layer at the at the top face of the upper electrode of the film bulk acoustic resonator; coating glue of a used flexible substrate on the silicon substrate and curing the glue; placing the whole finished structure in water to separate the polyimide film layer from the silicon substrate; using corrosive liquid to remove the metal post; placing the above structure into an acetone solution, dissolving the polymethyl methacrylate film layer, and forming an air gap; and removing the polyimide film layer below the film bulk acoustic resonator. By using the method of the invention to manufacture the film bulk acoustic resonator on the flexible substrate, the resonance performance of a device can be enhanced and the processing quality of the device can be guaranteed.

Description

technical field [0001] The invention belongs to the technical field of micro-electromechanical systems, and in particular relates to a method for manufacturing a film bulk acoustic wave resonator on a flexible substrate. Background technique [0002] Thin film bulk acoustic resonator is a new type of MEMS device developed in recent years. The basic structure of thin film bulk acoustic resonator is composed of piezoelectric film and electrodes, and its working frequency reaches several gigahertz. The working principle of the device is to use the piezoelectric effect of the piezoelectric film in the device to convert the input electrical energy into mechanical energy, and form a standing wave resonance in the piezoelectric film in the form of sound waves. Thin film bulk acoustic resonator has the advantages of lower insertion loss, larger power capacity, higher Q value, integration and miniaturization. Thus, thin-film bulk acoustic resonators exhibit enormous performance adv...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H03H9/17H03H3/02
CPCH03H3/02H03H9/171H03H9/174H03H2003/023
Inventor 陈达王璟璟刘维慧王鹏苗泉
Owner SHANDONG UNIV OF SCI & TECH
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