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Treating method for residual liquid and slag slurry produced in polysilicon production

A processing method and polysilicon technology, applied in the directions of halogenated silanes, halogenated silicon compounds, etc., can solve the problem of low economical efficiency, and achieve the effect of improving economical efficiency and reducing emissions

Inactive Publication Date: 2017-05-24
XINTE ENERGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, the economy is not high when directly adopting filtration and rectification recovery technology

Method used

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  • Treating method for residual liquid and slag slurry produced in polysilicon production
  • Treating method for residual liquid and slag slurry produced in polysilicon production
  • Treating method for residual liquid and slag slurry produced in polysilicon production

Examples

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Embodiment 1

[0030] This embodiment provides a treatment method for raffinate and slag in polysilicon production. The raffinate and slag contain silicon and silicon tetrachloride. The method includes the steps of: a) feeding the raffinate and slag A catalyst is added into the slurry to make the silicon react with the silicon tetrachloride to generate hexachlorodisilane.

[0031] The method for treating the raffinate and slurry in the production of polysilicon in this embodiment increases the content of hexachlorodisilane in the raffinate and slurry through the synthesis reaction of hexachlorodisilane, and obtains raffinate and slurry with high added value. Slurry improves the economics of the hexachlorodisilane recovery process; the solid waste and liquid waste in polysilicon production are rationally converted and recycled at the same time, which reduces the cost of raffinate and slurry treatment while achieving high additional Recycling of valuable products; solve the bottleneck problem ...

Embodiment 2

[0033] like figure 1 As shown, this embodiment provides a treatment method for raffinate and slag in polysilicon production. The raffinate and slag contain silicon and silicon tetrachloride. Specifically, the raffinate and slag in this embodiment The main composition of the slurry material is 1.7wt% of trichlorosilane, 64.9wt% of silicon tetrachloride, 11.0wt% of hexachlorodisilane, 12wt% of silicon powder, and the remaining components are metal chlorides, organochlorosilanes , high boiling silicone oil, etc. The method comprises the steps of: a) adding a catalytic amount of catalyst to the raffinate and slurry in the stirred tank reactor 1 under protective gas nitrogen, and the molar ratio of the catalyst to the silicon tetrachloride is 1:500, the catalyst is a copper complex [Cu(C 12 h 8 ) 2 ] BF 4 , making the silicon and the silicon tetrachloride react at 100°C for 6 hours to generate hexachlorodisilane, wherein the hexachlorodisilane in the raffinate and slurry after...

Embodiment 3

[0050] This embodiment provides a treatment method for raffinate and slurry in polysilicon production. The raffinate and slurry contain silicon and silicon tetrachloride. Specifically, the raffinate and slurry materials in this embodiment are The main composition is 1.3wt% of trichlorosilane, 40.0wt% of silicon tetrachloride, 13.3wt% of hexachlorodisilane, 14.1wt% of silicon powder, and the remaining components are metal chloride, organochlorosilane, high Boiling silicon oil, etc., the method comprises the steps: a) under protective gas nitrogen, add a catalytic amount of catalyst to the raffinate and slurry in the stirred tank reactor, the catalyst and the silicon tetrachloride The molar ratio is 1:200, the catalyst is copper complex {Cu[(Ph) 2 PCH 2 CH 2 CH 2 P(Ph) 2 ] 2}Cl and {Cu[P(Ph) 3 ] 3}Cl mixture (mass ratio 1:1), so that the silicon and the silicon tetrachloride were reacted for 18 hours at 250° C. to generate hexachlorodisilane, wherein the residue after the...

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Abstract

The invention discloses a treating method for residual liquid and slag slurry produced in polysilicon production, wherein the residual liquid and slag slurry contains silicon and silicon tetrachloride. The method comprises a step of adding a catalyst into the residual liquid and slag slurry so as to allow silicon to react with silicon tetrachloride so as to produce hexachlorodisilane. According to the treating method, through a synthesis reaction for hexachlorodisilane, the content of hexachlorodisilane in the residual liquid and slag slurry is increased, so residual liquid and slag slurry with high added value are obtained, and the economic performance of a hexachlorodisilane recovery process is improved; both solid waste and liquid waste produced in polysilicon production are reasonably converted and recycled, so treating cost for the residual liquid and slag slurry is lowered, and recovery of high-added-value products are realized; bottleneck problems in treating of the residual liquid and slag slurry during polysilicon production are overcome, and products of polysilicon production are diversified; and the discharge amounts of waste gas, waste water and industrial residues during polysilicon production are greatly reduced, and polysilicon production becomes environment-friendlier.

Description

technical field [0001] The invention belongs to the technical field of polysilicon production, and in particular relates to a treatment method for raffinate and slag in polysilicon production. Background technique [0002] With the rapid growth of demand for polysilicon, the scale of polysilicon production plants is also increasing. At present, many polysilicon plants have reached the production capacity of 10,000 tons. The production capacity of polysilicon is expanded, and more and more raffinate and slurry materials are discharged in the synthesis of trichlorosilane and hydrogenation of silicon tetrachloride (including thermal hydrogenation and cold hydrogenation) in the production of polysilicon. The main components of these raffinate and slurry materials are: 40wt% to 70wt% of monosilicon components such as silicon tetrachloride and trichlorosilane, 5wt% to 20wt% of hexachlorodisilane and hexachlorodisiloxane Alkanes and other di-silicon atom components, 5wt% to 10wt% ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/107
Inventor 夏高强刘兴平郑宝刚周迎春
Owner XINTE ENERGY
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