Quantum dot luminescent layer and device, and preparation methods thereof, luminescence module and display device
A quantum dot luminescence and quantum dot technology, which is applied in semiconductor devices, electrical components, circuits, etc., can solve the problems of uneven luminescence, uneven thickness, and low performance of devices, and improve the uniformity and stability of luminescence. Effects of stabilization and improvement of luminous efficiency and luminous lifetime
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Embodiment 1
[0063] The preparation steps of the QLED device are as follows:
[0064] Spin-coat a layer of PEDOT:PSS thin film on the ITO substrate as the hole injection layer;
[0065] Spin-coat a layer of PVK on the PEDOT:PSS layer as a hole transport layer;
[0066] Spin-coat a layer of CdSe@ZnS coated with mercaptopropionic acid (MPA) ligands on the PVK layer as the quantum dot light-emitting layer;
[0067] Next, the above-prepared CdSe@ZnS layer coated with mercaptopropionic acid (MPA) ligands was placed in a vacuum cavity, and trimethylaluminum ((CH 3 ) 3 Al) gas, where the internal pressure of the chamber is 0.05 mbar, the partial pressure of trimethylaluminum gas is 0.01 mbar, the internal temperature of the chamber is 16 °C, and the processing time is 5 min. Take it out after processing to obtain quantum dot crosslinking luminous layer;
[0068] Then, spin-coat one layer of ZnO on the quantum dot cross-linked luminescent layer prepared above as an electron transport layer;
...
Embodiment 2
[0071] The preparation steps of the QLED device are as follows:
[0072] Spin-coat a layer of PEDOT:PSS thin film on the ITO substrate as the hole injection layer;
[0073] Spin-coat a TFB layer on the PEDOT:PSS layer as a hole transport layer;
[0074] Spin-coat a layer of CdSe@ZnS coated with mercaptopropionic acid (MPA) ligands on the TFB layer as the quantum dot light-emitting layer;
[0075] Next, the above-prepared CdSe@ZnS layer coated with mercaptopropionic acid (MPA) ligands was placed in a vacuum cavity, and trimethylaluminum ((CH 3 ) 3 Al) gas, where the internal pressure of the cavity is 0.05 mbar, the partial pressure of trimethylaluminum gas is 0.02 mbar, the internal temperature of the cavity is 18 °C, and the processing time is 10 min. Take it out after processing to obtain quantum dot crosslinking luminous layer;
[0076] Then, spin-coat one layer of ZnO on the quantum dot cross-linked luminescent layer prepared above as an electron transport layer;
[00...
Embodiment 3
[0079] The preparation steps of the QLED device are as follows:
[0080] Spin-coat a layer of PEDOT:PSS thin film on the ITO substrate as the hole injection layer;
[0081] A layer of TFB was spin-coated on the PEDOT:PSS layer as a hole transport layer;
[0082] Spin-coat a layer of CdSe@ZnS coated with oleic acid (OA) ligand on the TFB layer as the quantum dot light-emitting layer;
[0083] Next, the above-prepared CdSe@ZnS layer coated with oleic acid (OA) ligands was placed in a vacuum chamber, and triethylaluminum ((CH 3 CH 2 ) 3 Al) gas, where the internal pressure of the cavity is 0.05 mbar, the partial pressure of triethylaluminum gas is 0.01 mbar, the internal temperature of the cavity is 18 °C, and the processing time is 20 min. Take it out after processing to obtain quantum dot crosslinking luminous layer;
[0084] Then, spin-coat one layer of ZnO on the quantum dot cross-linked luminescent layer prepared above as an electron transport layer;
[0085] Finally, ...
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