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Solar cell positive grid wire, solar cell and manufacturing method thereof

A solar cell and positive electrode technology, applied in the field of solar cells, can solve the problems of immature process stability, easy disconnection, binding force, and easy existence, etc., achieve high photoelectric conversion efficiency, overcome easy oxidation, and improve production efficiency.

Active Publication Date: 2017-12-01
BYD CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, there are electroplating after direct corrosion and electroplating after activating the silicon surface after corrosion, and electroplating after PVD priming. After direct corrosion, electroplating is easy to break and the bonding force is prone to problems. Electroplating generally requires light assistance.
The advantage of electroplating is that the contact resistance can be reduced theoretically and the conversion rate can be improved, but the process stability is not mature

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0051] This embodiment is used to illustrate the solar cell anode grid wire and solar cell electrode and the manufacturing method thereof provided by the present invention.

[0052] Spin-coat the metal paste (the metal paste is formed by mixing tetraisopropyl titanate, nickel acetylacetonate, ethyl maltol and solvent ethanol at a weight ratio of 0.20:0.05:0.36:1) onto the solar cell Silicon wafer (specification: 156cm 2 ×156cm 2 , the thickness is 180 μm, the same below), and then cover the mask on the surface of the solar cell silicon wafer coated with metal paste, the mask includes a light-transmitting area and an opaque area and the light-transmitting area The pattern is the positive grid line pattern, and then UV exposure, the exposure energy is 2000mj / cm 2, wherein, since the pattern of the light-transmitting region of the mask is a positive grid line pattern, the UV-exposed part is a positive grid line pattern. Afterwards, the mask is removed, and the solar cell silic...

Embodiment 2

[0060] This embodiment is used to illustrate the solar cell anode grid wire and solar cell electrode and the manufacturing method thereof provided by the present invention.

[0061] Spin-coat the metal paste (the metal paste is formed by mixing tetraisopropyl titanate, nickel acetylacetonate, ethyl maltol, and solvent ethyl acetate in a weight ratio of 0.20:0.05:0.31:1) onto On the front side of the silicon wafer of the solar cell, a mask is covered on the surface of the silicon wafer of the solar cell coated with the metal paste, the mask includes a light-transmitting area and an opaque area and the pattern of the light-transmitting area is positive Grid pattern, then UV exposure, exposure energy is 2000mj / cm 2 , wherein, since the pattern of the light-transmitting region of the mask is a positive grid line pattern, the UV-exposed part is a positive grid line pattern. Afterwards, the mask is removed, and the solar cell silicon wafer treated by UV exposure is treated with a t...

Embodiment 3

[0069] This embodiment is used to illustrate the solar cell anode grid wire and solar cell electrode and the manufacturing method thereof provided by the present invention.

[0070] Spin-coat the metal paste (the metal paste is formed by mixing tetraisopropyl titanate with nickel acetate, ethyl maltol, and solvent ethanol at a weight ratio of 0.2:0.05:0.34:1) onto the solar cell silicon On the front side of the sheet, and then cover the mask on the surface of the silicon wafer of the solar cell coated with the metal paste, the mask includes a light-transmitting area and an opaque area and the pattern of the light-transmitting area is a positive grid pattern , and then UV exposure, the exposure energy is 2000mj / cm 2 , wherein, since the pattern of the light-transmitting region of the mask is a positive grid line pattern, the UV-exposed part is a positive grid line pattern. Afterwards, the mask is removed, and the solar cell silicon wafer treated with UV exposure is treated wit...

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PUM

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Abstract

The invention relates to the field of solar cells, and provides a positive electrode grid line of a solar cell, the solar cell and a method for manufacturing the positive electrode grid lines of the solar cell and the solar cell. The method comprises: (1) applying metal paste to the front side of a solar cell silicon wafer, (2) light curing the area, which is on the surface of the solar cell silicon wafer coated with the metal paste and on which positive electrode grid lines are form, (3) soaking the light-cured solar cell silicon wafer in a photograph potion, so that the metal paste in the area not subjected to light-curing is dissolved in the photograph potion to form a titanium layer of patterned positive electrode gate lines, and (4) subjecting the product obtained in step (3) to high temperature sintering, surface activation and surface metallization sequentially. According to the method for manufacturing the positive electrode grid lines of the solar cell and the solar cell, the cost is greatly reduced, the production efficiency is improved, and the obtained photoelectric conversion efficiency of the solar cell is relatively high.

Description

technical field [0001] The invention relates to the field of solar cells, in particular to a solar cell positive grid, a method for manufacturing the solar cell positive grid, a solar cell and a method for manufacturing the solar cell. Background technique [0002] In 1839, the French physicist Becquerel first discovered the photovoltaic effect. In 1954, Bell Laboratories in the United States made the first monocrystalline silicon solar cell. In 1958, my country developed the first silicon single crystal, and the batteries developed were mainly used in the space field. At the end of the 1970s, my country and the world carried out research on gallium arsenide solar cells at the same time. This cell has a high light absorption coefficient. In 1999, 2cm 2 ×2cm 2 The conversion efficiency of the battery reaches 22%. In 1975, Ningbo and Kaifeng successively established solar battery factories. The battery manufacturing process imitated the early space battery production proce...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/0224H01L31/18
CPCH01L31/022425H01L31/18Y02E10/50
Inventor 韦家亮冷世伟林宏业连俊兰
Owner BYD CO LTD
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