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Negative photosensitive resin composition, partition wall, and optical element

A technology of photosensitive resin and composition, which is applied in the direction of nonlinear optics, optics, electrical components, etc., and can solve problems such as multi-exposure, sensitivity, and pattern shape influence

Active Publication Date: 2019-10-18
ASAHI GLASS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, for radical polymerizable photosensitive resin compositions, it is known that the curing of the outermost surface is inhibited by oxygen.
Therefore, in order to express sufficient ink repellency on the outermost surface using a photosensitive resin composition containing an ink repellent agent, a large amount of exposure is required, and as a result, sensitivity, pattern shape, residue, etc. may be affected

Method used

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  • Negative photosensitive resin composition, partition wall, and optical element
  • Negative photosensitive resin composition, partition wall, and optical element
  • Negative photosensitive resin composition, partition wall, and optical element

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0305] Hereinafter, the present invention will be described in more detail using examples, but the present invention is not limited to these examples. Examples 1, 2, and 3 are examples, and example 4 is a comparative example.

[0306] Each measurement was performed by the following method.

[0307] [Number average molecular weight (Mn)]

[0308] Using a commercially available GPC measuring device (manufactured by Tosoh Corporation, device name: HLC-8320GPC), gels of several types of monodisperse polystyrene polymers with different degrees of polymerization commercially available as standard samples for molecular weight measurement were measured. Permeation chromatography (GPC), according to the molecular weight of polystyrene and the relationship between retention time (retention time) to make a standard curve.

[0309] After diluting the sample with tetrahydrofuran to 1.0% by mass and passing it through a 0.5 μm filter, the GPC of the sample was measured using the aforement...

Synthetic example 1

[0337] [Synthesis Example 1: Synthesis of Ink Repellent (D1) and Preparation of (D1-1) Liquid]

[0338] At 50cm with the mixer 3 0.38 g of the above-mentioned compound (d-11) and 2.35 g of the above-mentioned compound (d-21) were charged in a three-necked flask, and a raw material mixture of the ink repellent agent (D1) was obtained. Next, 5.56 g of PGME was put into this raw material mixture to prepare a solution (raw material solution).

[0339] To the obtained raw material solution, 1.71 g of 1.0 mass % nitric acid aqueous solution was dripped, stirring at room temperature. After completion|finish of dripping, it stirred for 5 more hours, and obtained the PGME solution containing (D1) by 10 mass %, ie (D1-1) liquid. The fluorine-containing content (mass % of fluorine atoms) of the composition excluding the solvent of the obtained (D1-1) liquid was 20.0 mass %. In addition, the number average molecular weight (Mn) of the composition other than the solvent of (D1-1) liquid...

Synthetic example 2

[0340] [Synthesis Example 2: Synthesis of Ink Repellent (D2) and Preparation of (D2-1) Liquid]

[0341] At 50cm with the mixer 3 0.38 g of the above-mentioned compound (d-11), 1.11 g of the above-mentioned compound (d-21) and 0.72 g of the above-mentioned compound (d-31) were charged in a three-necked flask, and a raw material mixture of the ink repellent agent (D2) was obtained. Next, 6.36 g of PGME was put into this raw material mixture to prepare a solution (raw material solution).

[0342] To the obtained raw material solution, 1.43 g of a 1.0 mass % nitric acid aqueous solution was dripped, stirring at room temperature. After completion of the dropwise addition, it was further stirred for 5 hours to obtain a PGME solution containing (D2) at 10% by mass, that is, a (D2-1) liquid. The fluorine-containing content (mass % of fluorine atoms) of the composition excluding the solvent of the obtained (D2-1) liquid was 20.0 mass %. In addition, the number average molecular weig...

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Abstract

The present invention provides a negative photosensitive resin composition, a partition wall of an optical element, and an optical element. The negative photosensitive resin composition can form an ink repellent layer with sufficient ink repellency on the upper surface with a low exposure amount, and can be used For the manufacture of partition walls that maintain excellent ink repellency even after ink affinity treatment, the partition walls of optical elements have an ink repellent layer with sufficient ink repellency on the upper surface, and can form fine and high-precision patterns , excellent ink repellency can be maintained even after an ink affinity treatment, and the optical element has dots formed by uniformly applying ink to openings partitioned by partition walls and forming them with high precision. A negative photosensitive resin composition, which comprises: an alkali-soluble resin, a crosslinking agent, a photoacid generator, and an ink repellent, and the ink repellent contains a fluoroalkylene group and / or a fluoroalkyl group and has a Hydrolyzable silane compound with hydrolyzable group; cured film and partition wall formed using the negative photosensitive resin composition; and optical element having a plurality of dots and the aforementioned partition wall between adjacent dots on the substrate surface .

Description

technical field [0001] The present invention relates to a negative photosensitive resin composition, a partition wall and an optical element. Background technique [0002] In the manufacture of optical components such as organic EL (Electro-Luminescence; electroluminescent) components, quantum dot displays, TFT (Thin Film Transistor; thin film transistor) arrays, and thin film solar cells, sometimes organic layers such as light-emitting layers are used as dots, sprayed A method of pattern printing by the ink (IJ) method. In the above method, a partition wall is provided along the outline of the dot to be formed, and ink containing an organic layer material is injected into a section (hereinafter, also referred to as an "opening") surrounded by the partition wall and dried. And / or heating, etc., thereby forming dots of a desired pattern. [0003] In the above method, in order to prevent ink mixing between adjacent dots and evenly coat the ink in dot formation, the upper sur...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/075G02F1/1335G03F7/004G03F7/038H01L51/50H05B33/12H05B33/22
CPCG02F1/1335G03F7/004G03F7/038G03F7/075H05B33/12H05B33/22Y02E10/50H10K50/00H01L31/0445G02B5/20G03F7/0382
Inventor 川岛正行古川豊
Owner ASAHI GLASS CO LTD
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