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A Tunneling Field Effect Transistor with Increased On-state Current

A tunneling field effect, on-state current technology, applied in circuits, diodes, electrical components, etc., can solve problems such as difficult process realization, large off-state current of devices, and weak gate voltage control of the drain region. On-off ratio, low off-state current, and the effect of reducing process difficulty

Active Publication Date: 2019-07-19
UNIV OF ELECTRONICS SCI & TECH OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the device has the following problems: first, the thickness of the intrinsic region and the drain region are extremely thin, both less than 3nm, and it is difficult to realize the process; second, the control ability of the gate voltage on the drain region is weak, resulting in the off state of the device Larger current

Method used

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  • A Tunneling Field Effect Transistor with Increased On-state Current
  • A Tunneling Field Effect Transistor with Increased On-state Current
  • A Tunneling Field Effect Transistor with Increased On-state Current

Examples

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Embodiment 1

[0040] This embodiment is aimed at Figure 5 The Tunneling Field Effect Transistor (TFET) device that increases the on-state current is shown as an example of making an N-type TFET device. The polarized tunneling region is located in the P-type source region and is in contact with the epitaxial intrinsic region of the top layer. The length of the polarization tunneling region is the same as that of the gate, all of which are located under the gate.

[0041] The tunneling field effect transistor described in Embodiment 1 includes a source region 501 , an intermediate intrinsic region 502 , a drain region 503 , a polarization tunneling region 504 , an epitaxial intrinsic region 505 , sidewalls 506 , a gate oxide layer 507 , and a gate 508 . First, the source region, the middle intrinsic region, and the drain region are all made of silicon material to ensure that the source region can cause the polarization effect of the polarized tunneling region; secondly, ion implantation is p...

Embodiment 2

[0044] This embodiment is aimed at Figure 6 In the shown lateral tunneling field effect transistor (TFET) device for improving on-state current, its polarized tunneling region is located in the P-type source region and is in contact with the middle intrinsic region, and its upper surface coincides with the upper surface of the source region.

[0045] The tunneling field effect transistor described in Embodiment 2 includes a source region 601 , a polarized tunneling region 602 , an intermediate intrinsic region 603 , a drain region 604 , sidewalls 605 , a gate oxide layer 606 , and a gate 607 . First, the silicon material is still used to form the source region, the middle intrinsic region, and the drain region to ensure that the source region can cause the polarization effect of the polarized tunneling region, and the potential barrier of the middle intrinsic region can suppress the drift and diffusion of carriers; then Ion implantation is performed on the source region, the ...

Embodiment 3

[0048] This embodiment is aimed at Figure 7 In the shown tunneling field effect transistor (TFET) device with an oxide layer, an oxide layer is set between the middle intrinsic region and the drain region of the device to realize dielectric isolation.

[0049] The tunneling field effect transistor described in Embodiment 3 includes a source region 701, an intermediate intrinsic region 702, a drain region 703, a polarization tunneling region 704, an epitaxial intrinsic region 705, sidewalls 706, a gate oxide layer 707, a gate 708, oxide layer 709 . First, the source region, the middle intrinsic region, and the drain region are all made of silicon material to ensure that the source region can cause the polarization effect of the polarized tunneling region; secondly, oxidation is carried out between the middle intrinsic region and the drain region to form an oxide layer 709; after that, ion implantation is performed on the source region, the middle intrinsic region and the drai...

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Abstract

The invention relates to a tunneling field-effect transistor which improves the on-state current, and belongs to the field of logic devices and circuits in VLSI. The Tunneling Field Effect Transistor of the present invention passes InN or In at the top of the source region x Ga 1‑x N material forms a polarized tunneling layer, using InN or In x Ga 1‑x The polarization effect of N forms a polarized electric field, which enhances the carrier tunneling ability from the source region to the polarized tunneling region, and increases the tunneling current in the on state; since the conduction band of the epitaxial intrinsic region is not in the off state The carrier cannot drift and diffuse across the potential barrier to this region, which effectively reduces the off-state current of the device; the thickness of the epitaxial intrinsic region and the polarization tunneling region can be 5nm or more, which is conducive to the realization of the process. Under the premise of ensuring low off-state current, the tunneling field effect transistor of the present invention effectively improves the on-state current of the device and reduces the difficulty of the process.

Description

technical field [0001] The invention belongs to the field of logic devices and circuits in VLSI, and in particular relates to a small-sized tunneling field-effect transistor (TFET) capable of increasing on-state current. Background technique [0002] Under the guidance of Moore's Law, the integration of microprocessors has been continuously improved, which has promoted the development of logic switching devices. In logic switching devices, Tunneling Field Effect Transistor (TFET) has become an important part of the field of semiconductor devices because of its high on-state current, low off-state current, small sub-threshold swing and excellent switching ratio. research hotspots. [0003] Tunneling Field Effect Transistor (TFET) is different from previous field effect transistors. It is based on quantum mechanics and works through band-band tunneling; by applying gate voltage, the energy band of the intrinsic region is changed, so that the source region Carriers can tunnel...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L29/739H01L21/331
CPCH01L29/66356H01L29/7391
Inventor 王向展马阳昊曹建强谢林森夏琪归转转
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA
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