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Composition for nail polish removal and kit for nail polish removal including the same

A nail polish and composition technology, applied in the field of nail polish remover compositions, can solve the problems of nail damage, nail end falling off, nail end chipping, etc., and achieve the effect of reducing the risk of nail damage

Inactive Publication Date: 2016-10-05
JC KOREA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Exposure to organic solvents causes severe damage to the nail, the end of the nail opposite the cuticle may chip, or the portion of the end of the nail near the cuticle may fall off

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0017] Several aspects and various embodiments of the present invention will now be described in more detail.

[0018] One aspect of the present invention relates to a composition for removing nail polish, which includes (a) a polymer solution selected from polyurethane solutions, polyvinyl alcohol aqueous solutions, poly(meth)acrylate solutions, and mixtures thereof.

[0019] The polyurethane solution is composed of 25% to 40% by weight of polyurethane and 60% to 75% by weight of water. The polyvinyl alcohol aqueous solution is composed of 1% to 25% by weight of polyvinyl alcohol and 75% to 99% by weight of water. The poly(meth)acrylate solution is composed of 5% to 50% by weight of poly(meth)acrylate and 50% to 95% by weight of water.

[0020] According to one embodiment, the composition for removing nail polish may further include (b) silica gel or a fluorinated slip agent. In this embodiment, the composition for removing nail polish includes 95% to 99.9% by weight of polymer so...

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PUM

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Abstract

A composition for nail polish removal is disclosed. The composition for nail polish removal comprises (a) a polymer solution selected from a polyurethane solution, an aqueous solution of polyvinyl alcohol, a poly(mesh)acrylate solution, and mixtures thereof, wherein the polyurethane solution is composed of 25 to 40% by weight of polyurethane and 60 to 75% by weight of water, the aqueous solution of polyvinyl alcohol is composed of 1 to 25% by weight of polyvinyl alcohol and 75 to 99% by weight of water, and the poly(mesh)acrylate solution is composed of 5 to 50% by weight of poly(mesh)acrylate and 50 to 95% by weight of water. Also disclosed are a kit for nail polish removal including the composition, and a method for nail care.

Description

Technical field [0001] The present invention relates to a composition for removing nail polish and a kit for removing nail polish including the composition. Background technique [0002] The beauty industry is driven by people's desire to express physical beauty. The beauty industry has been rapidly developing and subdivided into various industry branches. Together with the promotion of the beauty industry, especially since the 20th century, the market for the beauty industry has expanded rapidly. Manicure, a type of beauty industry, is an important element of expressing body art, regardless of age and gender. In recent years, the development of nail art has made significant progress. [0003] Nail art was originally considered to be the field of beauty industry that modifies the human body. Nails reflect the changes and values ​​of contemporary culture through their length, shape and color. Nail art is performed using various materials. Ultraviolet (UV) gel has attracted peo...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/87A61K8/81A61K8/02A61Q3/04
CPCA61K8/0258A61K8/345A61K8/67A61K8/8129A61K8/8152A61K8/87A61K8/891A61Q3/04A61K2800/884A61K8/81A61K2800/81
Inventor 金玄石崔景植朴胄映崔正林金宝美
Owner JC KOREA
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