Perovskite photoelectric device and preparation method thereof and perovskite material
A technology of perovskite materials and optoelectronic devices, which is applied in the fields of electric solid state devices, semiconductor/solid state device manufacturing, photovoltaic power generation, etc. Improve efficiency and life, solve film discontinuity, and achieve the effect of energy transfer
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[0105] Example 1AX 1 preparation.
[0106] AX 1 The preparation method is as follows: dissolve A in tetrahydrofuran, then add hydriodic acid to react for 60 minutes, make the pH value of the reaction solution 4, remove the solvent by rotary evaporation to obtain a solid powder, wash the obtained powder with ether and filter three times to obtain it, as follows with C 10 h 7 CH 2 NH 3 The synthetic method of I is example, at first arylamine C 10 h 7 CH 2 NH 2 Dissolve in tetrahydrofuran, then add hydriodic acid to react for 60 minutes, make the pH of the reaction solution 4, remove the solvent by rotary evaporation to obtain a solid powder, wash and filter the obtained powder with ether three times to obtain a white C 10 h 7 CH 2 NH 3 I powder. According to this method, the synthesis of C 10 h 7 CH 2 NH 3 Br, C 10 h 7 CH 2 NH 3 Cl, C 6 h 5 CH 2 NH 3 I.C 6 h 5 (CH 2 ) 2 NH 3 I.C 6 h 5 (CH 2 ) 4 NH 3 I.
Embodiment 2
[0107] Example 2 Preparation of layered perovskite material.
[0108] Will C 10 h 7 CH 2 NH 3 I, NH 2 CH=NH 2 I and PbI 2 Prepare the precursor solution at a molar ratio of 2:1:2, spin-coat the above precursor solution on the substrate, and obtain a layered perovskite film with a multi-quantum well structure (referred to as NFPI for short) after annealing. 7 ).
[0109] Such as image 3 Shown, NFPI 7 The film has an obvious exciton absorption peak at 569nm, indicating that the main existence of this perovskite material is the material of N=2 ((C 10 h 7 CH 2 NH 3 ) 2 (NH 2 CH=NH 2 )[Pb 2 I 7 ]), and it can be seen that NFPI 7 The film contains N=1((C 10 h 7 CH 2 NH 3 ) 2 PB 4 ) and N=4((C 10 h 7 CH 2 NH 3 ) 2 (NH 2 CH=NH 2 ) 3 [Pb 4 I 13 ]) (X.Hong et al., Dielectric Confinement Effect on Excitons in PbI 4 -Based Layered Semiconductors.Phys.Rev.B.45,6961–6964(1992);K.Tanaka et al.,Bandgap and exciton binding energies inlead-iodide-based natura...
Embodiment 3
[0110] Example 3 Preparation of layered perovskite material.
[0111] Will C10 h 7 CH 2 NH 3 I, NH 2 CH=NH 2 Br and PbI 2 Prepare the precursor solution at a molar ratio of 2:1:2, spin-coat the above precursor solution on the substrate, and obtain a layered perovskite film with a self-assembled multiple quantum well structure (referred to as NFPI for short) after annealing. 6 B).
[0112] Such as Figure 8 Shown, NFPI 6 B thin film has obvious exciton absorption peak at 557nm, and photoluminescence peak is mainly located at 750nm, with the NFPI of embodiment 2 7 Films are similar. Figure 9 for NFPI 6 The surface morphology of the B film, indicating that NFPI 6 B thin film has good film-forming properties, and the root mean square roughness of the surface is only 2.6nm. Figure 10 for NFPI 6 From the TCSPC test results of the B film, it can be seen that the PL lifetime of the film is longer at 750nm, reaching 30ns.
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