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Method for coating diamond-like film on the surface of zinc sulfide substrate and zinc sulfide plate with diamond-like film

A diamond-like film and zinc sulfide technology, applied in gaseous chemical plating, sputtering plating, vacuum evaporation plating, etc., can solve the problems of film release, poor uniformity of film stress distribution, etc., and achieve the effect of preventing DLC ​​film from falling off

Active Publication Date: 2019-05-14
CHINA BUILDING MATERIALS ACAD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Because the larger the size of the substrate, the worse the uniformity of the stress distribution of the film, and the easier it is to cause the release of the film

Method used

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  • Method for coating diamond-like film on the surface of zinc sulfide substrate and zinc sulfide plate with diamond-like film
  • Method for coating diamond-like film on the surface of zinc sulfide substrate and zinc sulfide plate with diamond-like film
  • Method for coating diamond-like film on the surface of zinc sulfide substrate and zinc sulfide plate with diamond-like film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] Step 1: Clean the substrate

[0035] The zinc sulfide circular plate with a diameter of 200mm is carefully wiped clean with absorbent cotton dripped with a mixture of petroleum ether and alcohol before coating, and then ultrasonically cleaned in acetone for 15 minutes. Oven dry, set aside.

[0036] Step 2: Overcoating and plating

[0037] Put the cleaned zinc sulfide circular plate into the electron beam evaporation coating machine to coat the optical anti-reflection coating. The Ge film is used as the innermost layer of the anti-reflection coating system and also serves as a transition layer, with a thickness of 60nm. After the plating is completed, take out the zinc sulfide circular plate. The plating parameters are: bake at 100°C for 40 minutes, argon auxiliary anode at 300V, 1A.

[0038] Step 3: Surface Segmentation

[0039] figure 1 is a schematic diagram of the structure of the first grid mask, such as figure 1 As shown, the first grid cover includes a metal ...

Embodiment 2

[0047] Step 1: Clean the substrate

[0048] The zinc sulfide circular plate with a diameter of 250mm is carefully wiped clean with absorbent cotton dripped with a mixture of petroleum ether and alcohol before coating, and then ultrasonically cleaned in acetone for 15 minutes. Oven dry, set aside.

[0049] Step 2: Transition layer coating

[0050] Put the cleaned zinc sulfide circular plate into the electron beam evaporation coating machine to coat the optical anti-reflection coating. The Ge film is used as the innermost layer of the anti-reflection coating system and also serves as a transition layer, with a thickness of 60nm. After the plating is completed, take out the zinc sulfide circular plate, bake at 80°C for 60 minutes, and argon assist the anode at 310V, 1.1A.

[0051] Step 3: Surface Segmentation

[0052] When dividing the surface of the zinc sulfide substrate, first use a 10mm wide high-temperature adhesive tape to divide the zinc sulfide circular plate substrate...

Embodiment 3

[0059] Step 1: Clean the substrate

[0060] The square zinc sulfide plate with a side length of 10cm is carefully wiped clean with absorbent cotton dripped with a mixture of petroleum ether and alcohol before coating, and then ultrasonically cleaned in acetone for 15 minutes. After taking it out, dry the substrate with absorbent cotton, and finally wipe it with alcohol. Oven dry, set aside.

[0061] Step 2: Transition layer coating

[0062] Put the cleaned zinc sulfide circular plate into the electron beam evaporation coating machine to coat the optical anti-reflection coating. The Ge film is used as the innermost layer of the anti-reflection coating system and also serves as a transition layer, with a thickness of 60nm. After the plating is completed, take out the zinc sulfide circular plate. The plating parameters are: bake at 120°C for 30 minutes, argon assisted anode at 290V, 0.9A.

[0063] Step 3: Surface Segmentation

[0064] When dividing the surface of the zinc sulf...

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Abstract

The invention discloses a plating method for a diamond like carbon film on the surface of a zinc sulfide matrix and a zinc sulfide plate comprising the diamond like carbon film. The area of the zinc sulfide matrix is larger than or equal to 50 cm<2>. The plating method comprises the following step that 1, impurities on the surface of the zinc sulfide matrix are removed; 2, a transition layer is plated on the surface of the zinc sulfide matrix with the surface impurities removed, the transition layer is a Ge film, and the thickness is 60-80 nm; and 3, the diamond like carbon film is plated on the surface of the Ge film, specifically, the surface of the zinc sulfide plate is divided into zones with the area being 1-25 cm<2>, the zones are subjected to diamond like carbon film plating, and the thickness of the diamond like carbon film is 0.1-2[mu]m. The diamond like carbon film plated and prepared through the plating method is good in anti-disengagement performance.

Description

technical field [0001] The invention relates to the field of infrared material surface protection, in particular to a method for plating a diamond-like film on the surface of a zinc sulfide substrate and a zinc sulfide plate with a diamond-like film. Background technique [0002] Infrared technology plays a very important role in many fields such as contemporary weapons and equipment, and infrared windows and hoods are key components in infrared technology systems. Zinc sulfide (ZnS) is currently the most ideal infrared window because of its high transmittance in the infrared mid-wave 3-5um and long-wave 8-12um bands, and its mature preparation technology can meet the processing requirements of various sizes of optical hoods. and hood material. However, the requirements of infrared technology for materials are not limited to high infrared transmittance, and at the same time, it is necessary to protect the thermal imaging system against rain, dust and hail erosion during hig...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/30C23C14/18C23C14/02C23C16/26C23C16/513C23C16/04
CPCC23C14/021C23C14/18C23C14/30C23C16/042C23C16/26C23C16/513
Inventor 伏开虎金扬利祖成奎邱阳韩滨陈江赵慧峰王衍行赵华何坤徐博
Owner CHINA BUILDING MATERIALS ACAD
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