Preparation method for front electrode of organic thin film solar cell
A technology of solar cells and organic thin films, applied in circuits, photovoltaic power generation, electrical components, etc., can solve the problems of toxicity, rapid increase in resistivity, and high production costs, and achieve the effect of overcoming the low absorption efficiency of infrared bands and improving efficiency
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Embodiment 1
[0017] The present embodiment provides a kind of preparation method of the front electrode of organic thin film solar cell, it comprises the following steps:
[0018] (a) Take a glass slide (1cm×1cm) as the substrate, put it into the magnetron sputtering reaction chamber after drying, and use the radio frequency magnetron sputtering equipment to grow the AZO film. The specific parameters are: the temperature of the chamber during sputtering at 30°C, the sputtering pressure is 5×10 -4 Pa, the sputtering atmosphere is argon atmosphere, the thickness of the sputtered film is 50nm, the sputtering power is 120w, and the sputtering time is 20min;
[0019] (b) Add polyvinylpyrrolidone, 1-methyl-3-ethylimidazolium bromide and ethylene glycol in the reaction kettle to form a mixed solution; then add the ethylene glycol solution of silver nitrate to it, seal and place React at 100°C for 5 hours, then centrifuge, wash, and ultrasonically disperse to obtain an aqueous solution of silver ...
Embodiment 2
[0024] The present embodiment provides a kind of preparation method of the front electrode of organic thin film solar cell, it comprises the following steps:
[0025] (a) Take a glass slide (1cm×1cm) as the substrate, put it into the magnetron sputtering reaction chamber after drying, and use the radio frequency magnetron sputtering equipment to grow the AZO film. The specific parameters are: the temperature of the chamber during sputtering at 5°C, the sputtering pressure is 1×10 -4 Pa, the sputtering atmosphere is argon atmosphere, the thickness of the sputtered film is 30nm, the sputtering power is 100w, and the sputtering time is 10min;
[0026] (b) Add polyvinylpyrrolidone, 1-methyl-3-ethylimidazolium bromide and ethylene glycol in the reaction kettle to form a mixed solution; then add the ethylene glycol solution of silver nitrate to it, seal and place React at 120°C for 1 hour, then centrifuge, and ultrasonically disperse to obtain an aqueous solution of silver nanowire...
Embodiment 3
[0031] The present embodiment provides a kind of preparation method of the front electrode of organic thin film solar cell, it comprises the following steps:
[0032] (a) Take a glass slide (1cm×1cm) as the substrate, put it into the magnetron sputtering reaction chamber after drying, and use the radio frequency magnetron sputtering equipment to grow the AZO film. The specific parameters are: the temperature of the chamber during sputtering at 20°C, the sputtering pressure is 2×10 -4 Pa, the sputtering atmosphere is argon atmosphere, the thickness of the sputtered film is 40nm, the sputtering power is 110w, and the sputtering time is 15min;
[0033] (b) Add polyvinylpyrrolidone, 1-methyl-3-ethylimidazolium bromide and ethylene glycol in the reaction kettle to form a mixed solution; then add the ethylene glycol solution of silver nitrate to it, seal and place React at 110°C for 2 hours, then centrifuge, and ultrasonically disperse to obtain an aqueous solution of silver nanowi...
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