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A closed-loop high-temperature gas flow reaction device

A technology of high-temperature gas flow and high-temperature reaction, applied in the direction of inert gas generation, chemical/physical/physical-chemical processes, chemical instruments and methods, etc., can solve the problems of inability to realize continuous production, inability to recycle, low production efficiency, etc., and achieve reaction Remarkable effect, convenient operation and maintenance, and high yield

Active Publication Date: 2017-11-14
JIANGSU XIANDAO DRYING TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] In the prior art, the device usually used for sintering powder is a pusher furnace, the powder is placed in the crucible of the pusher furnace, after the sintering is completed, the material is manually taken out, and the crucible is placed on the pusher, and the work During the process, the push plate needs to be moved continuously. On the one hand, it is necessary to take and discharge materials every time sintering is completed, which cannot realize continuous production, and the production efficiency is low. On the other hand, it is necessary to continuously replenish the ammonia decomposition gas to maintain the push plate furnace. The atmosphere in the furnace needs to be flushed with nitrogen gas before heating up, and the gas cannot be recycled, which makes the operation cost higher

Method used

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  • A closed-loop high-temperature gas flow reaction device
  • A closed-loop high-temperature gas flow reaction device

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Embodiment Construction

[0018] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0019] The purpose of the present invention is to provide a closed-circuit circulating high-temperature gas flow reaction device to solve the problems existing in the prior art, so that powder sintering can realize continuous reaction and continuous sintering production, and improve the utilization rate of inert gas.

[0020] In order to make the above-mentioned purpose, features and advantages of the present invention more obvious and understandable, the prese...

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Abstract

The invention discloses a closed-cycle high-temperature airflow reaction device. The device comprises a fan, a waste heat recovery device, a pressure balancing device, a secondary heater, a feeder, an accelerator, a high-temperature reacting furnace, a three-level heater, a cooling system, a dedusting system and a discharging device. Continuous reaction and continuous sintering production can be realized by virtue of a vertical box reaction cavity, the investment cost of equipment is reduced greatly, the closed-cycle high-temperature airflow reaction device has the characteristics of compact structure, convenience in operation and maintenance, good controllability, energy conservation and emission reduction, remarkable reaction effect, no material retention or piling, short reaction time, high rate of finished products, exquisite design and high practicability and can fully utilize heat of exhaust, and the investment to mated infrastructure is less.

Description

technical field [0001] The invention relates to the field of powder sintering, in particular to a closed-loop high-temperature gas flow reaction device. Background technique [0002] In the prior art, the commonly used device for sintering powder is a pusher furnace. The powder is placed in the crucible of the pusher furnace, and after the sintering is completed, the material is manually taken out, and the crucible is placed on the pusher to work. During the process, the push plate needs to be moved continuously. On the one hand, it is necessary to take and discharge materials every time sintering is completed, which cannot realize continuous production, and the production efficiency is low. On the other hand, it is necessary to continuously replenish the ammonia decomposition gas to maintain the push plate furnace. The atmosphere in the furnace needs to be flushed with nitrogen gas before heating up, and the gas cannot be recycled, which makes the operation cost higher. C...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01J19/14B01J19/00
CPCB01J19/0013B01J19/14B01J2219/00058
Inventor 蒋中昕
Owner JIANGSU XIANDAO DRYING TECH CO LTD
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