Array substrate and manufacturing method therefor
The technology of an array substrate and its manufacturing method, which is applied in the field of display, can solve the problems of high production cost, achieve the effects of reasonable structure, save photolithography process, and reduce the use of photomasks
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[0046] In order to further illustrate the technical means adopted by the present invention and its effects, the following describes in detail in conjunction with preferred embodiments of the present invention and accompanying drawings.
[0047] see Figure 1-12 , the present invention provides a method for manufacturing an array substrate, comprising the following steps:
[0048] Step 1, such as figure 1 As shown, a substrate 10 is provided, a first metal layer is formed on the substrate 10 by physical vapor deposition (PVD), and the first metal layer is patterned through a photolithography process to obtain a gate 20 .
[0049] Specifically, the substrate 10 is a transparent substrate, preferably a glass substrate.
[0050] Specifically, the material of the first metal layer may be one or more stacked combinations of molybdenum (Mo), titanium (Ti), aluminum (Al), and copper (Cu).
[0051] Specifically, the photolithography process includes a photolithography process, a wet...
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