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Fabrication method of waveguide Bragg grating based on sio2 loaded strip waveguide

A waveguide Bragg and manufacturing method technology, applied in the field of integrated optical devices, can solve the problems of difficult to guarantee product consistency, unsuitable for mass production, small process tolerance, etc., to achieve good product consistency, excellent optical consistency, The effect of large process tolerances

Active Publication Date: 2019-05-10
HENAN SHIJIA PHOTONS TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0011] The invention aims to solve the technical problems in the existing waveguide Bragg grating manufacturing technology, such as small process tolerance, complex process, large size, high cost, difficult to guarantee product consistency, and unsuitable for mass production, so as to provide a method that is compatible with Waveguide Bragg grating compatible with semiconductor process, easy to integrate, small in size, low in cost, customizable, simple in process, large in process tolerance, suitable for mass production and its manufacturing method

Method used

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  • Fabrication method of waveguide Bragg grating based on sio2 loaded strip waveguide
  • Fabrication method of waveguide Bragg grating based on sio2 loaded strip waveguide
  • Fabrication method of waveguide Bragg grating based on sio2 loaded strip waveguide

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Embodiment 1

[0042] Embodiment 1: as figure 1 As shown, a SiO-based 2 A waveguide Bragg grating loaded with a strip waveguide includes a base layer 4, a slab core layer 3, a guiding core layer 2 and an upper cladding layer 1, the slab core layer 3 covers the front surface of the base layer 4, and the guiding core layer 2 Located on the front side of the flat core layer 3 , the upper cladding layer 1 covers the front side of the flat core layer 3 and wraps the guiding core layer 2 .

[0043] Wherein, the thickness of the base layer 4 is 500 μm-1500 μm, the thickness of the flat core layer 3 is 1 um-2 um, the thickness of the guiding core layer 2 is 4 um-8 um, and the thickness of the upper cladding layer 1 is 15-24 um. The material of the base layer 4 is quartz glass, and the material of the flat core layer 3 is silicon dioxide doped with relatively high concentration of germanium, with a refractive index of 1.46566-1.4801. The material of the guiding core layer 2 is silicon dioxide mater...

Embodiment 2

[0044] Embodiment 2: a kind of based on SiO 2 A waveguide Bragg grating loaded with a strip waveguide, comprising a base layer, a slab core layer, a guide core layer and an upper cladding layer, the slab core layer is covered on the front side of the base layer, and the guide core layer is located on the front side of the slab core layer , the upper cladding layer covers the front surface of the flat core layer and wraps the guiding core layer. All the other are identical with embodiment 1.

[0045] The base layer material is made of quartz glass, which has good heat resistance, high transparency and excellent optical consistency. The upper cladding material is silicon dioxide doped with boron and phosphorus, which has good fluidity during high temperature reflow. The silicon dioxide material doped with germanium is selected for the flat core layer and the guide core layer. This material has better uniformity of refractive index and film thickness, and the stress of the film...

Embodiment 3

[0046] Embodiment 3: a kind of based on SiO 2 A waveguide Bragg grating loaded with a strip waveguide, the cross section of the waveguide Bragg grating is loaded with a strip waveguide structure. All the other are identical with embodiment 2.

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Abstract

The invention discloses a waveguide Bragg grating based on a SiO2 strip-loaded waveguide and a manufacturing method thereof. The waveguide Bragg grating comprises a substrate layer, a flat core layer, a guide core layer and an upper coating, wherein the flat core layer covers the front side of the substrate layer, the guide core layer is positioned on the front side of the flat core layer, and the upper coating covers the front side of the flat core layer and wraps the guide core layer. The waveguide Bragg grating has the advantages of simplicity in process, low cost, good consistency, large-scale production and the like; and compared with a manufacturing process of an outer ridge modulation type waveguide Bragg grating based on a ridge waveguide, the manufacturing method has the advantages that the process is simple, the cost is low, the size is small and the like.

Description

technical field [0001] The invention belongs to the technical field of integrated optical devices, and in particular relates to a manufacturing method of a waveguide Bragg grating. Background technique [0002] Like the coaxial cable transmission system, the optical network system also needs to filter the optical signal, which requires a waveguide Bragg grating to achieve. Based on waveguide Bragg gratings, devices such as mode converters, mode beam splitters, mode add / drop multiplexers and demultiplexers can be formed, and they are the core devices to realize high-speed mode division multiplexing technology. Based on the waveguide Bragg grating, an ultra-narrow linewidth waveguide Bragg grating external cavity semiconductor laser can also be constructed, which is an ideal light source for coherent optical communication systems. Waveguide Bragg gratings, also known as short-period waveguide gratings, are one of the most important passive components in optical fiber communic...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B6/124G02B6/13
CPCG02B6/124G02B6/13
Inventor 田亮尹小杰张家顺安俊明
Owner HENAN SHIJIA PHOTONS TECH
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