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Ultraviolet light exposure system capable of emitting light in parallel and exposure machine

An exposure system and exposure machine technology, applied in the field of ultraviolet exposure, can solve problems such as unfavorable manufacturing process, environmental damage, and harmfulness to the operator, and achieve the effects of improving stability, avoiding expansion and contraction deformation, and good parallelism

Inactive Publication Date: 2016-05-18
东莞王氏港建机械有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The high-pressure mercury lamps used in traditional exposure machines contain a large amount of harmful mercury, which damages the environment
Due to its wide spectral range, it will generate long-wave infrared rays, which will emit heat that is not conducive to the process; it will also generate electromagnetic radiation with a wavelength of less than 240nm, and its energy is less than 5.2eV, which has exceeded the binding energy of oxygen molecules in the air.
As a result, ozone with a strong odor and pollution can be generated, which is harmful to the operator's body

Method used

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  • Ultraviolet light exposure system capable of emitting light in parallel and exposure machine
  • Ultraviolet light exposure system capable of emitting light in parallel and exposure machine
  • Ultraviolet light exposure system capable of emitting light in parallel and exposure machine

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] Example 1: Please also refer to figure 1, the parallel emission ultraviolet exposure system provided in this embodiment, which includes: a light source assembly 1 for providing a UV-LED light source and emitting ultraviolet light; a concentrator 2 for receiving and converging ultraviolet light; a shutter 3 for Control the exposure time and exposure amount; the curved mirror 4 is used to reflect the received ultraviolet light and then parallel incident it to the surface of the exposure table 5 for exposure. The light source assembly 1 includes a plurality of UV-LED light sources, and the plurality of UV light -LED light source, all illuminated to the concentrator and focused to project energy onto the concentrator. The light source assembly 1 is preferably five UV-LED light sources arranged one by one to form a concave surface. In addition, the number of UV-LED light sources can also be less than five or more than five, but can be arranged to form a concave mirror shape...

Embodiment 2

[0042] Example 2: Please also refer to figure 2 , the parallel light emitting ultraviolet exposure system provided in this embodiment is basically the same as that of Embodiment 1, the difference is that the parallel light emitting ultraviolet exposure system adopts a single light source assembly, and also includes a flip mirror 6, and the flip mirror 6 is arranged on the shutter 2 and the exposure table 5; the flip mirror 6 is used to expose the upper and lower surfaces of the exposure table 5 under the condition of a single light source, and the flip mirror 6 is parallel or perpendicular to the exposure table 5 in different states: when the flip mirror When it is arranged parallel to the exposure table 5 (Fig. b), the light is reflected and then incident on the curved mirror located above, and then irradiated parallel to the upper surface of the exposure table for exposure. When the flip mirror and the exposure table 5 are arranged perpendicular to each other (Fig. a) The l...

Embodiment 3

[0044] Example 3: Please also refer to image 3 , the parallel light emitting ultraviolet exposure system provided in this embodiment is basically the same as that of Embodiment 1, the difference is that the parallel light emitting ultraviolet exposure system adopts a single light source assembly and also includes a beam splitter 7, and the beam splitter 7 is set Between the shutter 2 and the exposure stage 5; the beam splitter 7 is used to expose the upper and lower surfaces of the exposure stage 5 under the condition of a single light source, and the beam splitter 7 can realize 50% of the incident light on the beam splitter The light is reflected to the curved mirror at the top and then irradiated parallel to the upper surface of the exposure table for exposure, and at the same time, the other 50% of the light incident on the beam splitter is incident to the curved mirror at the bottom and then irradiated parallel to the lower surface of the exposure table The surface is exp...

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Abstract

The invention relates to the technical field of exposure treatment, and particularly discloses an ultraviolet light exposure system capable of emitting light in parallel. The system comprises a light source module, a condenser, a shutter, a curved mirror, an exposure table and other structures. A two-light-source assembly or a single-light-source assembly is adopted in the ultraviolet light exposure system capable of emitting light in parallel. The invention further provides an exposure machine with the ultraviolet light exposure system capable of emitting light in parallel. According to the ultraviolet light exposure system capable of emitting light in parallel, multiple UV-LED light sources are adopted and all irradiate the condenser, the light focus on the condenser, the UV-LED can emits continuous ultraviolet light, the heat dissipation performance is significantly improved, the parallel light is good in parallelism and high in uniformity, and ultraviolet light transmission is stable and is not affected by external factors, so that the uniformity of the ultraviolet light entering a printed circuit board is ensured, and the exposure quality is improved.

Description

technical field [0001] The invention relates to the field of ultraviolet exposure technology, in particular to a parallel emitting ultraviolet light exposure system and an exposure machine. Background technique [0002] In the circuit manufacturing process of PCB, semiconductor and LCD touch screen, an important link is to use the method of optical exposure to transfer the image between the film and the printed board, and the exposure machine is the key equipment to realize the image transfer. Issues of quality, accuracy, etc. largely depend on exposure quality. Within the effective exposure area of ​​the illuminated table, the parallelism and energy uniformity of the ultraviolet rays determine the exposure quality of the system. [0003] However, the existing arrayed UV-LED exposure systems on the market have poor parallelism of ultraviolet light, limited energy uniformity, and low exposure accuracy, which affects the quality of image transfer. In addition, the traditiona...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/2004G03F7/2008G03F7/70008G03F7/70075
Inventor 霍锦充
Owner 东莞王氏港建机械有限公司
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