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Electron Emission Cathode Array Based on Metal Molybdenum Substrate and Its Fabrication Method

A field electron emission, molybdenum substrate technology, used in cold cathode manufacturing, electrode system manufacturing, discharge tube/lamp manufacturing, etc., can solve the problem of uneven emission of metal cathodes, complicated manufacturing, and poor adhesion between metal cathodes and substrates and other problems, to achieve the effect of increasing the field electric emission current, less process and low cost

Active Publication Date: 2019-04-05
PEKING UNIV
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  • Summary
  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

[0006] The technical problem to be solved in the present invention is how to solve the problems of poor adhesion between the metal cathode and the substrate, uneven emission of the metal cathode and complicated fabrication

Method used

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  • Electron Emission Cathode Array Based on Metal Molybdenum Substrate and Its Fabrication Method
  • Electron Emission Cathode Array Based on Metal Molybdenum Substrate and Its Fabrication Method
  • Electron Emission Cathode Array Based on Metal Molybdenum Substrate and Its Fabrication Method

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Embodiment Construction

[0035] The present invention will be described in further detail below in conjunction with the accompanying drawings and embodiments. The following examples are used to illustrate the present invention, but should not be used to limit the scope of the present invention.

[0036] The invention discloses a method for manufacturing a field electron emission cathode array based on a metal molybdenum substrate, such as figure 1 As shown, the method includes the following steps:

[0037] S1. Form an etching mask on the metal molybdenum substrate, and use the etching mask to perform high-density ion plasma dry etching on the metal molybdenum substrate to form a metal molybdenum cone; wherein the etching mask comprising an insulating layer formed on the metal molybdenum substrate and a gate layer formed on the insulating layer;

[0038] S2. Remove the etching mask on the tip of the metal molybdenum cone.

[0039] Compared with the existing Spindt process, the invention completely s...

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Abstract

The invention discloses a field electron emission cathode array based on a molybdenum substrate and a preparation method thereof. According to the invention, an etching mask is firstly formed on a molybdenum substrate; then high density plasma dry etching is carried out to the molybdenum substrate to form molybdenum pointed cones. The molybdenum pointed cones are directly formed on the substrate; the problem of poor adhesion with underlay is thoroughly solved; heavy current and strong electric field can be borne; high rate isotropic etching is carried out to the molybdenum body material through the high density plasma dry etching method; therefore large area appearance accordant molybdenum pointed cone arrays can be obtained at the same time; large area even emission can be realized; only primary etching is contained in the manufacturing process of the field electron emission cathode array; the pointed cone centers and gate hole centers are automatically aligned without deflection; compared with the prior art, the technical solution of the invention is featured by few procedures, high efficiency, simplicity and low cost and is applicable to large scale preparation.

Description

technical field [0001] The invention relates to the field of vacuum microelectronics, in particular to a field electron emission cathode array based on a metal molybdenum substrate and a manufacturing method thereof. Background technique [0002] With the rapid development of electric vacuum technology, micro-nano processing technology, micro-electromechanical system MEMS technology and surface packaging technology, various disciplines are integrated internationally, and vacuum microelectronics is gradually formed. Among them, the field electron emission is to suppress the emission surface potential barrier through an external strong electric field, so that the height of the potential barrier is reduced and the width is narrowed, so that the free electrons inside the object enter the vacuum through the tunnel effect, and then obtain ions with a very high ratio of monatomic ions current. The field emission cathode does not require external energy, can achieve instant start-u...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J1/304H01J9/02
CPCH01J1/3042H01J9/025
Inventor 朱宁莉徐楷斯陈兢
Owner PEKING UNIV
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