Organic thin film transistor array substrate and manufacturing method therefor

Abstract

The invention discloses an organic thin film transistor array substrate and a manufacturing method therefor. The manufacturing method comprises: continuously depositing on a substrate to form a metal layer thin film, then depositing an indium tin oxide (ITO) layer, coating a photoresist layer to form source and drain patterns, a data line and an anode of a pixel electrode simultaneously after a first manufacturing process for a mask, then manufacturing an organic semiconductor layer, an organic insulation layer, a gate electrode, a scanning line and a passivation layer in sequence, finally digging the covered passivation layer in the position of the pixel electrode (namely the OLED anode) to expose the electrode at the bottom layer, and then plating an OLED material layer on the exposed ITO pixel electrode to form an OLED device.

Description

【Technical field】 [0001] The invention relates to the field of display technology, in particular to an organic thin film transistor array substrate and a manufacturing method thereof. 【Background technique】 [0002] Organic thin film transistor (OrganicThinFilmTransistor, OTFT) is a thin film transistor made of organic matter as a semiconductor material. OTFT can be produced at low temperature or normal temperature, so the substrate of OTFT can be replaced by lighter, thinner and cheaper plastic instead of glass. Compared with traditional inorganic thin-film transistors, OTFT is simpler to manufacture, and has lower requirements on the conditions and purity of the film-forming environment, so its manufacturing cost is relatively low, and its simple process characteristics and excellent flexibility have greatly improved its application in many fields. It can be applied to flexible display, electronic skin, flexible sensor and other fields. [0003] In the conventional fabric...

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Problems solved by technology

In addition, the electrode material of the current OTFT generally chooses silver (Ag), a metal material with a low work function, to reduce the contact resistance, but Ag is easily oxidized without a protective layer to reduce the conductivity.

[0004] In view of the above problems, the present invention proposes a new manufacturing method for OTFT array substrates, which not only reduces the number of times of photomask, lithography, and etching processes required in the overall manufacturing process, but also protects the electrodes of the metal layer, such as silver electrodes, from Oxidation occurs in subsequent processes, which affects the quality of devices made of OTFT array substrates

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