Bias voltage regulation and control aperture plate plasma immersion ionic deposition DLC method
An ion deposition and plasma technology, which is applied in gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of poor bonding force, difficult adjustment of film properties, uneven deposition of DLC film, etc. The effect of improved binding force, stable glow discharge and easy industrial production
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specific Embodiment approach 1
[0029] Specific implementation mode 1: In this implementation mode, the bias control grid plasma immersion ion deposition DLC method is carried out according to the following steps:
[0030] 1. Place the grid 4 in the vacuum chamber 5, and then place the workpiece on the sample holder 6 in the grid 4. The grid 4 is insulated from the workpiece, and the grid 4 passes the high-voltage pulse of the wire and the grid high-voltage pulse power supply 1. The output end is connected, and a grid high-voltage pulse waveform oscilloscope 7 is arranged between the grid 4 and the grid high-voltage pulse power supply 1; the workpiece is connected to the pulse output end of the workpiece high-voltage pulse power supply 3 through a wire, and the workpiece and the workpiece high-voltage pulse A workpiece high-voltage pulse waveform oscilloscope 8 is arranged between the power sources 3; the phase between the workpiece high-voltage pulse and the grid high-voltage pulse is controlled by the pulse...
specific Embodiment approach 2
[0039] Embodiment 2: This embodiment differs from Embodiment 1 in that: in step 2, the pulse voltage of the grid high-voltage pulse outputted by the grid high-voltage pulse power supply 1 is adjusted to 2kV, the frequency is 2000Hz, and the pulse width is 20μs. Others are the same as the first embodiment.
specific Embodiment approach 3
[0040] Embodiment 3: The difference between this embodiment and Embodiment 1 or 2 is that in step 2, the pulse voltage of the workpiece high-voltage pulse output by the workpiece high-voltage pulse power supply 3 is adjusted to 3kV, the frequency is 2000Hz, and the pulse width is 20μs. Others are the same as those in Embodiment 1 or 2.
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