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A kind of preparation method of titanium alloy ta2 surface high solar absorption rate low emissivity film layer

A technology with solar absorptivity and low emissivity, applied in the direction of surface reaction electrolytic coatings, coatings, electrolytic coatings, etc., can solve the problems of low bonding force between the film layer and the substrate, high emissivity, and low solar absorptivity, etc. Achieve excellent binding force and thermal stability, simple process, easy to achieve effect

Active Publication Date: 2017-06-20
HARBIN INST OF TECH
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  • Summary
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  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to solve the problems that existing coatings on the surface of titanium alloy TA2 have low solar absorption rate, high self-emission rate, and low bonding force between the film layer and the substrate, and provide a titanium alloy TA2 surface with high solar absorption Preparation method of low emissivity film layer

Method used

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  • A kind of preparation method of titanium alloy ta2 surface high solar absorption rate low emissivity film layer

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specific Embodiment approach 1

[0022] Specific embodiment one: this embodiment is a kind of preparation method of titanium alloy TA2 surface high solar absorptivity low emissivity film layer is finished according to the following steps:

[0023] 1. Pre-treatment of titanium alloy TA2: use 240-mesh water-grit paper and 1000-mesh water-grit paper to polish titanium alloy TA2 in turn to obtain titanium alloy TA2 with deburr and oxide layer removed; immerse titanium alloy TA2 with deburr and oxide layer into HF and HNO 3 3s~10s in the mixed solution to obtain the titanium alloy TA2 with smooth surface; use NaOH solution to remove the oil on the surface of the titanium alloy TA2 with smooth surface, then wash it with distilled water, and finally dry it with a hair dryer to obtain the treated titanium alloy TA2;

[0024] The NaOH solution described in step 1 is formed by mixing NaOH and distilled water, and the volume ratio of the mass of NaOH to distilled water is (8g~15g):1L;

[0025] HF and HNO as described i...

specific Embodiment approach 2

[0035] Embodiment 2: The difference between this embodiment and Embodiment 1 is that the main film-forming agent described in step 2 is sodium aluminate. Other steps are the same as in the first embodiment.

specific Embodiment approach 3

[0036] Specific embodiment three: the difference between this embodiment and specific embodiment one or two is: in step two, the auxiliary film-forming agent is one of trisodium phosphate, sodium hypophosphite, sodium hexametaphosphate and polyphosphoric acid or a mixture of several of them. Other steps are the same as those in Embodiment 1 or 2.

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Abstract

The invention discloses a method for preparing a film layer with high solar absorption rate and low emissivity on the surface of titanium alloy TA2, which relates to a method for preparing a ceramic film layer on the surface of titanium alloy TA2. The purpose of the invention is to solve the problems of low solar energy absorption rate, high self-emission rate and low bonding force between the film layer and the substrate in the coating on the surface of the existing titanium alloy TA2. Method: pretreatment of titanium alloy TA2; second, micro-arc oxidation to obtain a high solar absorption rate and low emissivity film on the surface of titanium alloy TA2. The thickness of the high solar absorptivity and low emissivity film layer on the surface of the titanium alloy TA2 prepared by the present invention is 0.3 μm to 1 μm, the roughness of the film layer is 0.2 μm to 0.25 μm, the solar absorptivity is 0.82 to 0.9, and the emissivity is 0.08 to 0.08 μm. 0.13. The invention can obtain a method for preparing a film layer with high solar absorption rate and low emissivity on the surface of titanium alloy TA2.

Description

technical field [0001] The invention relates to a method for preparing a ceramic film layer on the surface of titanium alloy TA2. Background technique [0002] The industrial pure titanium commonly used in industry is TA2, because of its moderate corrosion resistance and comprehensive mechanical properties, low strength, good plasticity, easy processing, stamping, welding, cutting, good performance; in the atmosphere, sea water, wet chlorine gas It has good corrosion resistance in oxidizing, neutral and weakly reducing media, and its oxidation resistance is better than most austenitic stainless steels. Therefore, titanium alloy TA2 is widely used in industry and aerospace. [0003] The energy crisis has drawn people's attention to solar energy as a clean energy source, but the radiation energy density of the sun's radiation after it hits the earth is low, which brings great obstacles to the large-scale utilization of solar energy. Therefore, it is necessary to pass Some way...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C25D11/26
Inventor 姚忠平魏晗李东琦夏琦兴姜兆华
Owner HARBIN INST OF TECH
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