A method for controlling the process of changing stages in a double-workpiece stage system
A technology of double workpiece table and process control, which is applied in the direction of photolithography process exposure device, microlithography exposure equipment, etc., can solve the problems of large impact of table body and low positioning accuracy of workpiece table.
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[0027] Specific implementation mode one: combine figure 1 , figure 2 , image 3 , Figure 4 , Figure 5 , Image 6 As shown, its method steps are:
[0028] Step 1: The first clamping mechanism 2-2 on the first X-direction moving platform 2-1 in the first horizontally moving platform assembly 2 grabs the first workpiece table 1, and the first horizontally moving platform assembly 2 Move the first workpiece table 1 to the left pretreatment working position A through its own Y-direction movement and the X-direction movement of the first X-direction moving platform 2-1; The second clamping mechanism 4-2 on the second X-direction moving platform 4-1 grabs the second workpiece table 3, and the second horizontal moving platform assembly 4 moves through its own Y direction and the second X direction The X-direction movement of the mobile platform 4-1 moves the second workpiece table 3 to the right exposure working position B;
[0029] Step 2: After the preprocessing work and e...
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