Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A method for controlling the process of changing stages in a double-workpiece stage system

A technology of double workpiece table and process control, which is applied in the direction of photolithography process exposure device, microlithography exposure equipment, etc., can solve the problems of large impact of table body and low positioning accuracy of workpiece table.

Active Publication Date: 2017-03-22
HARBIN INST OF TECH
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide a method for controlling the changing process of a double work table system, which is to solve the problem that the existing double work table technology adopts a linear table changing scheme, the positioning accuracy of the work table is low, and the table change process has an impact on the table body. bigger problem

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A method for controlling the process of changing stages in a double-workpiece stage system
  • A method for controlling the process of changing stages in a double-workpiece stage system
  • A method for controlling the process of changing stages in a double-workpiece stage system

Examples

Experimental program
Comparison scheme
Effect test

specific Embodiment approach 1

[0027] Specific implementation mode one: combine figure 1 , figure 2 , image 3 , Figure 4 , Figure 5 , Image 6 As shown, its method steps are:

[0028] Step 1: The first clamping mechanism 2-2 on the first X-direction moving platform 2-1 in the first horizontally moving platform assembly 2 grabs the first workpiece table 1, and the first horizontally moving platform assembly 2 Move the first workpiece table 1 to the left pretreatment working position A through its own Y-direction movement and the X-direction movement of the first X-direction moving platform 2-1; The second clamping mechanism 4-2 on the second X-direction moving platform 4-1 grabs the second workpiece table 3, and the second horizontal moving platform assembly 4 moves through its own Y direction and the second X direction The X-direction movement of the mobile platform 4-1 moves the second workpiece table 3 to the right exposure working position B;

[0029] Step 2: After the preprocessing work and e...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a method for controlling the table change process of a dual-workpiece table system and belongs to the technical field of semiconductor manufacturing equipment. The method comprises the following steps: a first workpiece table moves to the pretreatment operation position at the left side; a second workpiece table moves to an exposure operation position at the right side; a first X-direction moving platform moves to a card change position at the left side, and a second X-direction moving platform moves to a card change position at the right side; a revolution motor drives the first workpiece table and the second workpiece table to rotate anticlockwise for 180 degrees; the second workpiece table moves to the pretreatment operation position at the left side; the first workpiece table moves to the exposure operation position at the right side; the revolution motor drives the first workpiece table and the second workpiece table to rotate clockwise for 180 degrees. According to the method disclosed by the invention, a rotation table change scheme is adopted, and compared with a linear table change scheme, the scheme has the advantages that the impact on table bodies in the table change process is reduced, the table change time is shortened, the positioning precision of the workpiece table is enhanced, and a crucial effect is taken for the productivity increase of photoetching machines.

Description

technical field [0001] The invention belongs to the technical field of semiconductor manufacturing equipment. Background technique [0002] The rapid development of modern science and technology has put forward higher and higher requirements for the manufacturing capacity of VLSI. Chips are becoming more and more refined and the integration level is getting higher and higher. It is an inevitable trend in the development of integrated circuits. As a very large-scale circuit manufacturing equipment, lithography machines are currently mainly monopolized by developed countries such as Europe and the United States. my country's cutting-edge chips still rely on imports, which seriously restricts my country's development in aviation, aerospace, ships, electric power and other fields. In order to break the monopoly and improve my country's integrated circuit manufacturing capacity, my country has listed the development of scanning lithography equipment as a major national science an...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
Inventor 刘杨董岳宋法质
Owner HARBIN INST OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products