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Rotating table type femtosecond laser direct writing method and device

A femtosecond laser and writing device technology, applied in laser welding equipment, metal processing equipment, welding equipment, etc., can solve the problems of processing efficiency, processing accuracy and processing range that cannot be adjusted

Active Publication Date: 2015-10-07
JILIN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The invention provides a rotary table-type femtosecond laser direct writing method and device, which mainly solves the problem of irreconcilable processing efficiency, processing accuracy and processing range existing in the existing femtosecond laser direct writing scheme

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  • Rotating table type femtosecond laser direct writing method and device
  • Rotating table type femtosecond laser direct writing method and device
  • Rotating table type femtosecond laser direct writing method and device

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Embodiment Construction

[0019] The technical solutions of the present invention will be further specifically described below through the embodiments and in conjunction with the accompanying drawings. In the specification, the same or similar reference numerals designate the same or similar bottom members. The following description of the embodiments of the present invention with reference to the accompanying drawings is intended to explain the general inventive concept of the present invention, but should not be construed as a limitation of the present invention.

[0020] Such as figure 1 , according to an exemplary embodiment of the present invention, the rotary table femtosecond laser direct writing device includes a femtosecond laser, and the femtosecond laser emitted by it is reflected by the infrared dielectric mirror 2, and the power is attenuated by the linear gradient neutral density filter 3 Finally, the switch and intensity control of the laser exposure is performed by the acousto-optic mo...

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Abstract

The invention discloses a rotating table type femtosecond laser direct writing device. The rotating table type femtosecond laser direct writing device comprises a femtosecond laser source, a laser path, an X-Y axis two-dimension translation table, a rotating table and a controller, wherein the laser path is provided with a laser modulator, a two-dimension laser scanning galvanometer and a microobjective, after being modulated by the laser modulator, laser beams from the femtosecond laser source pass through the two-dimension laser scanning galvanometer to be projected onto a machined workpiece through the microobjective; the rotating table is arranged on the X-Y axis two-dimension translation table, a rotating shaft of the rotating table is aligned with a direct writing light axis, the table face of the rotating table is perpendicular to the direct writing light axis, and the machined workpiece is fixed onto the table face of the rotating table, and the controller is constructed into a form capable of controlling the laser beams incoming onto the machined workpiece through the laser path and the operation of the X-Y axis two-dimension translation table and the rotating table.

Description

technical field [0001] Embodiments of the present invention belong to the field of micro-nano processing, and in particular, relate to a rotary table femtosecond laser direct writing method and device. technical background [0002] Femtosecond laser micro-nano direct writing processing is a kind of non-linear interaction between the tightly focused "focus" of ultrashort laser pulses and matter, which can induce photophysical and photochemical changes on the sub-wavelength scale at least, and make local materials The characteristics are irreversibly changed, and the manufacturing technology of micro-nano device structure is realized through computer pattern generation and focus scanning. Its notable features are: a wide spectrum of applicable materials, suitable for the processing of brittle, hard and difficult-to-machine materials such as sapphire; non-mask technology, suitable for the processing of non-planar three-dimensional complex structures; high precision, suitable fo...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B23K26/082B23K26/064
CPCB23K26/0823B23K26/352
Inventor 孙洪波于颜豪陈岐岱姜俊
Owner JILIN UNIV
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