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Expansion polymerization imprinting glue for nano-imprinting

A technology of nano-imprinting and imprinting glue, applied in the field of nano-imprinting, can solve the problems of decreased fidelity of imprinted patterns, delamination of imprinted glue, and cannot be completely eliminated.

Active Publication Date: 2015-09-23
SOUTH UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Volume shrinkage not only leads to a decrease in the fidelity of the embossed graphics, but also the shrinkage force in the imprinted adhesive will reduce the bonding strength between the imprinted adhesive and the substrate, and delamination occurs inside the imprinted adhesive
At the same time, the shrinkage of the embossing rubber increases the difficulty of demoulding, resulting in an increase in the defect rate of graphic replication after demoulding
[0006] Due to the ring-opening polymerization of epoxy oligomers in traditional imprinting adhesives, the volume shrinkage rate is relatively low, but it still cannot be completely eliminated.
Other methods for reducing volume shrinkage, such as reducing the concentration of functional groups in the reaction system, adding high-molecular-weight polymers for toughening, and adding inorganic fillers, can only reduce volume shrinkage to a certain extent, but cannot completely eliminate it.

Method used

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  • Expansion polymerization imprinting glue for nano-imprinting
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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0068] Embodiment 1: A kind of spiro ring orthocarbonate, epoxy resin mixed embossing glue system

[0069] The raw materials required for the preparation of the expanded polymeric embossing glue for nanoimprinting in this embodiment include oligomers, expansion monomers, and photoinitiators, wherein the oligomers are epoxy resin monomers, and the expansion monomers are spirogen Carbonate compounds, specifically 2,4,8,10-tetramethyl-1,5,7,11-tetraoxaspiro[5,5]undecane, the structure is shown in formula VI, and the photoinitiator is Triaryliodonium salts.

[0070]

[0071] The preparation process of the expansion polymer imprinting glue for nanoimprinting in this embodiment is as follows: epoxy resin oligomer, expansion monomer 2,4,8,10-tetramethyl-1,5,7,11-tetramethyl-1,5,7,11-tetra Oxyspiro[5,5]undecane and triaryliodonium salt photoinitiator were evenly mixed in the dark. The weight percent of oligomer, expansion monomer and photoinitiator are 90wt%, 9wt%, 1wt% respectiv...

Embodiment 2

[0073] Embodiment 2: A kind of spiro ring orthocarbonate, silicon-containing epoxy resin mixed embossing adhesive system

[0074] The raw materials required for the preparation of the expanded polymeric imprinting glue for nanoimprinting in this embodiment include oligomers, expansion monomers, photoinitiators, and diluents, wherein the oligomers are silicon-containing epoxy resin monomers, and the expansion monomers The body is a spiro ring orthocarbonate compound, specifically 1,5,7,11-tetraoxaspiro[5,5]undecane, the structure is shown in formula VII, the photoinitiator is a triaryl iodonium salt, dilute The agent is PGMEA.

[0075]

[0076] The preparation process of the expansion polymer imprint glue for nanoimprinting in this embodiment is as follows: the silicon-containing epoxy resin oligomer, the expansion monomer 1,5,7,11-tetraoxaspiro[5,5]undecane , photoinitiator and diluent PGMEA were evenly mixed in the dark. The weight percentages of oligomer, expansion mono...

Embodiment 3

[0079] Embodiment 3: A kind of spiro ring orthocarbonate, silicon-containing epoxy resin mixed embossing adhesive system

[0080]The raw materials required for the preparation of the expanded polymeric imprinting glue for nanoimprinting in this embodiment include oligomers, expansion monomers, photoinitiators, and diluents, wherein the oligomers are silicon-containing epoxy resin monomers, and the expansion monomers The body is a spiro ring orthocarbonate compound, specifically 1,5,7,11-tetraoxaspiro[5,5]undecane, the structure is shown in formula VII, the photoinitiator is a triaryl iodonium salt, dilute The agent is an epoxy cationic reactive diluent.

[0081] The preparation process of the expansion polymer imprint glue for nanoimprinting in this embodiment is as follows: the silicon-containing epoxy resin oligomer, the expansion monomer 1,5,7,11-tetraoxaspiro[5,5]undecane , photoinitiator and diluent were evenly mixed in the dark. The weight percentages of oligomer, expa...

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Abstract

The invention discloses an expansion polymerization imprinting glue for nano-imprinting. Raw materials required for the preparation of the expansion polymerization imprinting glue comprise a low polymer and an expansion monomer. Compared with the prior art, after the expansion polymerization imprinting glue for nano-imprinting is introduced in the expansion monomer, the expansion monomer can be polymerized with the low polymer, the volume change of the impressing glue after polymerization can be adjusted, and thus the volume shrinkage after the imprinting glue is cured is reduced or even eliminated; and the imprinting glue with zero curing shrinkage or volume expansion can be obtained by adjusting the content of the expansion monomer. The imprinting glue can effectively reduce the residual stress in a micro-nano figure, and the generation of figure defects in the nano-imprinting demolding process caused by the residual stress is reduced while accurate figure copying is realized.

Description

technical field [0001] The invention relates to the technical field of nano-imprinting, in particular to an expansion polymerization embossing glue for nano-imprinting. Background technique [0002] Micro-nano manufacturing is an advanced manufacturing technology with extensive influence, covering major engineering fields such as microelectronics, optoelectronics, micro-nano optics, and bioengineering. How to manufacture micro-nano patterns and structures on a large scale and at low cost is a key issue related to the industrialization of many high-tech industries. Nanoimprint technology is a micro-nano manufacturing technology that has developed rapidly in the world in recent years. With its ultra-high pattern accuracy, simple process and equipment, and high process throughput, it has attracted the attention of academia and industry, and is considered to be the next step. One of the most promising technologies for the generation of low-cost, large-scale fabrication of nanos...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004
CPCG03F7/038C08G59/1455C08G59/306C08G4/00G03F7/0002C08G59/42C08K5/0025C08K5/0058C08L67/00C08L2312/00G03F7/039
Inventor 程鑫李自平范增驹田颜清罗冰清陈宇龙井水淼余波
Owner SOUTH UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA
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