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Fundamental transverse mode microcolumn laser based on polymer

A basic transverse mold and polymer technology, applied in the field of lasers, can solve the problems of complex laser production technology, unsuitable for mass production, and high production cost, and achieve the effects of being beneficial to mass production, easy to shape processing, and low processing cost.

Active Publication Date: 2015-08-12
INST OF ADVANCED TECH UNIV OF SCI & TECH OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In order to solve the technical problems in the background technology, the present invention proposes a polymer-based fundamental transverse mode micro-cylindrical laser, which aims to solve the problems of complex laser production technology, high production cost and low yield in the prior art. Problems not suitable for mass production

Method used

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  • Fundamental transverse mode microcolumn laser based on polymer
  • Fundamental transverse mode microcolumn laser based on polymer

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Embodiment Construction

[0030] Such as figure 1 and 2 As shown, a kind of polymer-based fundamental transverse mode micro-cylindrical laser proposed by the present invention includes a base 1 and a plurality of micro-cylindrical optical units 2, wherein:

[0031] The optical units 2 are distributed in an array, and can be used in parallel optical transmission systems, optical interconnection networks of parallel processing computer cluster systems, and ultra-small high-performance optical interconnection parallel multiprocessor systems in space-borne free space. The optical unit 2 includes two distributed Bragg reflectors 4, a resonant cavity 3 sandwiched between the two distributed Bragg reflectors 4, and the distributed Bragg reflector 4 has two polymers with different refractive indices A periodic structure formed by alternating thin films; the resonant cavity 3 is made of an organic semiconductor or a single-layer polymer film doped with an active medium, and among the two distributed Bragg refl...

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Abstract

The invention discloses a fundamental transverse mode microcolumn laser based on polymer. The laser comprises a substrate and at least a microcolumn optical unit. The optical unit is installed on the substrate. The optical unit comprises two distributed Bragg reflectors and a resonant cavity clamped between the two distributed Bragg reflectors. The distributed Bragg reflector has a periodic structure formed by alternated arrangement of thin polymer films in two different refractive indexes. The resonant cavity is made of an organic semiconductor or signal-layer polymer films doped with an active medium. A thin polymer film layer is processed by three different manufacturing methods. Through nanoimprint lithography, at least a microcolumn optical unit is imprinted, and a microlens structure is imprinted on the light outgoing end of the distributed Bragg reflector which is far away from a substrate. The laser is simple in manufacturing process, low in material and processing costs, and fast in processing speed, and is suitable for volume production.

Description

technical field [0001] The invention belongs to the technical field of lasers, in particular to a polymer-based fundamental transverse mode microcolumn laser. Background technique [0002] In the prior art, miniaturization and integration are an inevitable trend in the development of lasers. With the reduction of the characteristic size of lasers, the manufacturing process of lasers becomes complicated, which reduces the manufacturing efficiency and increases the cost. [0003] The distributed Bragg reflector (DBR) of the laser has a periodic structure in which two semiconductor materials with different refractive indices are arranged alternately in an ABAB manner. Semiconductor materials are commonly used as thin film materials, and the difference in refractive index of semiconductor materials is small. Therefore, semiconductor materials It is necessary to use more layers to obtain high reflectivity, which is not conducive to simplifying the process and reducing the cost. ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01S5/20H01S5/125
Inventor 岳文成姚培军刘文
Owner INST OF ADVANCED TECH UNIV OF SCI & TECH OF CHINA
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