A bimodal distribution nano-silver paste used as thermal interface material and preparation method thereof
A thermal interface material, bimodal distribution technology, used in semiconductor/solid-state device manufacturing, circuits, electrical solid-state devices, etc., can solve problems such as device failure, and achieve uniform size, high thermal conductivity, and stable and reliable process conditions.
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Embodiment 1
[0036] Example 1 Preparation of a bimodal distribution nano-silver paste used as a thermal interface material
[0037] Mix small-size nano-silver particles (average particle size 9nm), large-size nano-silver particles (average particle size 52nm) and ultrapure water at a mass ratio of 7:3:50, mechanically stir for 50 minutes, and ultrasonically disperse in ice water 40min, and then centrifuged at a speed of 4000rpm for 15min again to remove the upper layer solution to obtain the bimodal distribution nano-silver paste precipitated at the bottom.
[0038] The SEM picture of the bimodal distribution nano-silver paste prepared by mixing is as follows figure 1 shown.
[0039] Apply bimodal distribution nano-silver paste on the surface of the interconnection between SiC chip and Cu substrate to form a sandwich structure of SiC chip / bimodal distribution nano-silver paste / Cu substrate, and place it on a heating plate at a temperature of 200°C for 20 minutes to form a sintered joint ...
Embodiment 2
[0040] Example 2 Preparation of a bimodal distribution nano-silver paste used as a thermal interface material
[0041] Mix small-size nano-silver particles (average particle size 21nm), large-size nano-silver particles (average particle size 117nm) and ultrapure water at a mass ratio of 2:1:12, mechanically stir for 30 minutes, and ultrasonically disperse in ice water 40min, and then centrifuged at a speed of 3000rpm for 10min again to remove the upper layer solution to obtain the bimodal distribution nano-silver paste precipitated at the bottom.
[0042] The laser particle size analyzer scanning image of the prepared uniformly mixed bimodal distribution nano-silver paste is as follows: figure 2 shown.
[0043] Apply bimodal distribution nano-silver paste on the surface of the interconnection between SiC chip and Cu substrate to form a sandwich structure of SiC chip / bimodal distribution nano-silver paste / Cu substrate, and place it on a heating plate at a temperature of 150°C...
Embodiment 3
[0044] Example 3 Preparation of a bimodal distribution nano-silver paste used as a thermal interface material
[0045] Mix small-size nano-silver particles (average particle size 15nm), large-size nano-silver particles (average particle size 81nm) and ultrapure water at a mass ratio of 3:2:30, mechanically stir for 30 minutes, and ultrasonically disperse in ice water 30min, and then centrifuged at a speed of 3000rpm for 20min again to remove the upper layer solution to obtain the bimodal distribution nano-silver paste precipitated at the bottom.
[0046] Apply bimodal distribution nano-silver paste on the surface of the interconnection between SiC chip and Cu substrate to form a sandwich structure of SiC chip / bimodal distribution nano-silver paste / Cu substrate, and place it on a heating plate at a temperature of 200°C for 30 minutes to form a sintered joint .
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