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Method for coating photoresist film and coating equipment using method

A kind of coating equipment and coating technology, applied in the direction of total factory control, total factory control, electrical program control, etc., can solve the problems of reduced production efficiency, uneven thickness of photoresist film, time-consuming and labor-consuming, etc.

Active Publication Date: 2015-05-20
SHENZHEN CHINA STAR OPTOELECTRONICS TECH CO LTD
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Problems solved by technology

[0005] In order to solve the problems of time-consuming and labor-intensive control of the existing photoresist film thickness, and the reduction of production efficiency caused by uneven photoresist film thickness, the present invention provides a control method for controlling the slit-type extrusion coating equipment. Wherein, the slit extrusion coating equipment includes a control system, and the method includes:

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  • Method for coating photoresist film and coating equipment using method
  • Method for coating photoresist film and coating equipment using method
  • Method for coating photoresist film and coating equipment using method

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Embodiment Construction

[0032] The invention will now be referred in detail to embodiments of the invention, examples of which are illustrated in the accompanying drawings, wherein like reference numerals refer to like parts throughout. The embodiments are described below in order to explain the present invention by referring to the figures.

[0033] figure 1 It is a schematic diagram of coating photoresist with a slot-type extrusion coating equipment; figure 2 yes figure 1 The enlarged view of part A in , which also shows the elastohydrodynamic model of the photoresist film thickness according to the embodiment of the present invention (the elastohydrodynamic model of the photoresist film thickness will be described later).

[0034] Such as figure 1 with figure 2 As shown, the slot type extrusion coating apparatus includes a coating platform 150, a coating die 100, a pressure pump (not shown) for supplying photoresist to the coating die 100, and a control for controlling the coating operation....

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Abstract

The invention provides a method for coating a photoresist film and coating equipment using the method. The method comprises the following steps of (A) according to known parameters of a photoresist and equipment parameters of the coating equipment, obtaining a closed loop transfer function of a control system; (B) according to the closed loop transfer function, performing PID (Proportional-Integral-Differential) control on a BP (back propagation)-based neural network. According to the method for coating the photoresist film provided by the embodiment of the invention, under the condition that a set coating speed of the coating equipment is kept, the thickness of the coated photoresist film can be controlled only by adjusting the flow rate of the photoresist, so that the thickness of the photoresist film is automatically adjusted at the optimal coating speed of the coating equipment, manual adjustment by a worker is not required, the labor is saved, the adjusting and controlling time is quickened, and the working efficiency is improved.

Description

technical field [0001] The invention relates to a method for coating a photoresist film and equipment using the method. Background technique [0002] The coating equipment (Coater) is used to evenly coat the photoresist on the glass substrate, so that the exposure machine can react the photoresist through the mask, and the reacted photoresist is easier to be washed away by the developer, and the unreacted The photoresist remains on the surface of each layer of the TFT to play a protective role. Finally, the same circuit pattern as the photomask can be obtained through the etching process, which constitutes the basic electrical function of the TFT, and the thickness of the photoresist film has an important impact on this. [0003] In the TFT-LCD process technology, the coating methods mainly include spin coating and linear coating (curtain coating and slit extrusion coating). High efficiency, easy to obtain high-precision, thin-thickness coating, so it has become the most wi...

Claims

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Application Information

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IPC IPC(8): G05B19/418C03C17/00
CPCY02P90/02G05B19/418C03C17/002
Inventor 刘晓乐迟文宏李晶波覃伟武
Owner SHENZHEN CHINA STAR OPTOELECTRONICS TECH CO LTD
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