Plasma all-dimensional vacuum coated power supply and coating method thereof

A vacuum coating and plasma technology, applied in the direction of ion implantation coating, vacuum evaporation coating, electrical components, etc., can solve the problems of power supply output parameters mismatch, poor coating quality, power supply is vulnerable to impact, etc., to reduce unit cost , good binding force, and the effect of improving efficiency

Inactive Publication Date: 2015-04-08
HEFEI YONGXIN PLASMA TECH
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  • Abstract
  • Description
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  • Application Information

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Problems solved by technology

[0004] The purpose of the present invention is to overcome the defects of the prior art, to provide a plasma all-round vacuum coating power supply for industrialization and a method for coating with its power supply, mainly to solve the problems of mismatching power supply output parameters, poor coating quality, The power supply is vulnerable to impact and other problems, so that the power supply can better serve the industrialization

Method used

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  • Plasma all-dimensional vacuum coated power supply and coating method thereof
  • Plasma all-dimensional vacuum coated power supply and coating method thereof
  • Plasma all-dimensional vacuum coated power supply and coating method thereof

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Embodiment Construction

[0035] Such as Figures 1 to 6As shown, a plasma omnidirectional vacuum coating power supply includes a circuit for controlling the plasma omnidirectional vacuum coating power supply, and the circuit for controlling the plasma omnidirectional vacuum coating power supply also includes a filter 1, a rectifier circuit 2, a filter circuit 3, and a DC inverter Variable circuit 4, high-frequency step-up transformer 5, secondary rectification circuit 6, secondary filter circuit 7, IGBT chopping 8, plasma load 9, the input power is connected to the rectification circuit 2 through the filter 1, and the rectification circuit 2 is connected to the filter The circuit 3 is connected, the filter circuit 3 is connected with the DC inverter circuit 4, the DC inverter circuit 4 is connected with the high-frequency step-up transformer 5, the high-frequency step-up transformer 5 is connected with the secondary rectification circuit 6, and the secondary rectification circuit 6 is connected with th...

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Abstract

The invention discloses a plasma all-dimensional vacuum coated power supply. The power supply comprises a circuit connecting to an input power supply. The circuit comprises a filter, a rectifying circuit, a filter circuit, a direct current inverter circuit, a high-frequency step-up transformer, a secondary rectifying circuit, a secondary filter circuit, an IGBT (Insulated Gate Bipolar Transistor) chopper, a plasma load and a resistor. The invention further provides a coating method of the plasma all-dimensional vacuum coated power supply. The plasma all-dimensional vacuum coated power supply has the high peak current up to 1000A and accordingly increases the ionization rate of plasma to obtain the dense coating having good binding force. Furthermore, the plasma all-dimensional vacuum coated power supply has the advantages of reducing the costs, improving the efficiency and reducing the defect rate.

Description

technical field [0001] The invention belongs to the technical field of plasma surface engineering, and relates to a plasma omni-directional vacuum coating power supply and a coating method using the power supply. Background technique [0002] Plasma surface engineering technology is a technology developed in recent decades, which plays an important role in the development of contemporary manufacturing, especially in the field of high-end manufacturing. Plasma omni-directional ion coating technology is a kind of plasma surface engineering technology, which has many advantages, such as: it can realize omni-directional coating on the surface of three-dimensional workpiece without rotating the workpiece, and can even coat the inner wall of the pipe; the prepared class Diamond coating has high hardness, generally 20% to 30% of diamond, and has an extremely low friction coefficient, generally 0.05 to 0.1 under dry friction conditions. In addition, the coating also has the characte...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H02M5/458C23C14/00
CPCH02M7/217C23C14/00H02M3/335
Inventor 李灿民陶满
Owner HEFEI YONGXIN PLASMA TECH
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