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Atmospheric-pressure chemical vapor deposition coating reactor

A technology of atmospheric pressure chemical gas phase and reactor, which is applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of limiting the scope of application of APCVD method and reducing the thermal efficiency of APCVD coating, and achieve novel design ideas, The effect of low cost and small investment

Active Publication Date: 2015-03-25
ZHEJIANG UNIV
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  • Abstract
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Problems solved by technology

These requirements greatly reduce the thermal efficiency of the APCVD coating, so that the coating reaction must be carried out stably in a relatively high temperature range and a narrow temperature window, which severely limits the scope of application of the APCVD method.

Method used

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Embodiment Construction

[0025] Such as figure 1 and figure 2 Shown, a kind of atmospheric pressure chemical vapor deposition coating reactor, comprises two rectangular parallelepiped air mixing chambers 8 as the main body of the reactor, the insulation layer 2 covered on the air mixing chamber 8, the slit 6 as the reactor coating nozzle, The elongated graphite stopper 4 at the exit of the slit, and the supporting air inlet pipe 1 and the reactor supporting and moving mechanism.

[0026] Two identical cuboid gas mixing chambers 8 are connected together with the gas mixing chamber partition 7 as a symmetrical mirror surface to form the main structure of the coating reactor, and are distributed upstream and downstream in the moving direction of the deposition substrate or glass ribbon. The two fully symmetrical gas mixing chambers 8 of the main structure of the coating reactor are connected by a partition 7 between the two gas mixing chambers 8 as a symmetrical mirror surface. When one of them is use...

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Abstract

The invention discloses an atmospheric-pressure chemical vapor deposition coating reactor. The coating reactor is characterized in that a gas-mixing chamber having enhanced convection and a beam structure is designed inside the reactor; the bottom of the reactor structurally adopts high-temperature-resistant steel plates having good heat conductivity; the outlet of the gas-mixing chamber adopts a slit structure as a nozzle for coating gas in the reactor; a graphite stopper having a chamfer structure is mounted at the nozzle of the reactor; the gas inlet cavity and an exhaust cavity of the reactor adopt fully symmetrical structures; and the coating gas inlet and coating exhaust directions of the reactor can be interchanged. According to the atmospheric-pressure chemical vapor deposition coating reactor, by enhancing the convective heat transfer of the precursor gas, the thermal efficiency of the reaction is increased, the coating deposition reaction can be performed at a relatively low temperature, the energy consumption of the coating is reduced and the coating temperature window is widen. The coating reactor has the advantages of novel design idea, simple maintenance of the device, small investment and low cost and is suitable for application in industrial or laboratory devices.

Description

technical field [0001] The invention relates to the technical field of chemical vapor deposition coating and deep processing of float glass, in particular to an atmospheric pressure chemical vapor deposition coating reactor. Background technique [0002] Chemical vapor deposition (CVD) is currently the most common method for obtaining large-area thin films. The method obtains strong bonding force between the thin film and the deposition substrate, dense bulk structure of the thin film, simple preparation process, wide range of thin film materials, and easy industrial production. Among them, the atmospheric pressure chemical vapor deposition method (APCVD) refers to a CVD coating method in which the coating environment pressure is similar to the atmospheric pressure. It is widely used in the field of float online large-area coating. Many domestic and foreign patents and documents involve this method and technology. . [0003] The invention patent with the publication number...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/453C23C16/455
CPCC23C16/453C23C16/455
Inventor 刘涌韩高荣宋晨路汪建勋刘新沈鸽
Owner ZHEJIANG UNIV
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